Intensive optimization of masks and sources for 22nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Rosenbluth, Alan E ^a   Melville, David O ^a   Tian, Kehan ^b   Bagheri, Saeed ^b   Azpiroz, Jaione Tirapu ^b   Lai, Kafai ^b   Waechter, Andreas ^a   Inoue, Tadanobu ^c   Ladanyi, Laszlo ^a   Barahona, Francisco ^a   Scheinberg, Katya ^a   Sakamoto, Masaharu ^c   Muta, Hidemasa ^c   Gallagher, Emily ^d   Faure, Tom ^d   Hibbs, Michael ^d   Tritchkov, Alexander ^e   Granik, Yuri ^e  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM RESEARCH   (United States)

^c IBM RESEARCH TOKYO   (Japan)

^d IBM   (United States)

^e MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

DOE; Pixelated source; Programmable illuminator; SMO; Source mask optimization; Wavefront engineering

Indexed keywords

DOE; PIXELATED SOURCE; PROGRAMMABLE ILLUMINATOR; SMO; SOURCE MASK OPTIMIZATION;

DENSITY (OPTICAL); DIFFRACTIVE OPTICAL ELEMENTS; MASKS; PHASE SHIFT; WAVEFRONTS;

OPTIMIZATION;

EID: 65849129717     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814844     Document Type: Conference Paper

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