Mask inspection system with variable sensitivity and printability verification function

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7748, Issue , 2010, Pages

  Inoue, Takafumi ^a   Takahara, Kenichi ^a   Tsuchiya, Hideo ^a   Tokita, Masakazu ^a   Inoue, Tadao ^b   Yamabe, Masaki ^c  

^a Mask Inspection Equipment Technology Research Laboratory   (Japan)

^b Mask Design Data Technology Research Laboratory   (United States)

^c Mask Design Drawing and Inspection Technology Research Department (Mask D2I)   (United States)

Author keywords

Die to database; Mask Data Rank (MDR); Mask Error Enhancement Factor (MEEF); Mask inspection; Printability

Indexed keywords

DEFECT DETECTION; DEFECT DETECTION SENSITIVITY; DESIGN INTENT; DESIGN STAGE; MASK DATA; MASK DEFECTS; MASK ERROR ENHANCEMENT FACTORS; MASK INSPECTION; MASK INSPECTION SYSTEMS; MASK OPTIMIZATION; NEW TECHNOLOGIES; PATTERN DATUM;

DATABASE SYSTEMS; DEFECTS; DIES; INSPECTION EQUIPMENT; MASKS; TECHNOLOGY;

INSPECTION;

EID: 77954401386     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.864415     Document Type: Conference Paper

References (3)

1. Hideo Tsuchiya, et al, "Die-to-database mask inspection with variable sensitivity", Proc. of SPIE Vol.7028, 70282I (2008).
2. Masakazu Tokita, et al, "A study of mask inspection method with pattern priority and printability check", Proc. of SPIE Vol.7379, 73792A (2009).
3. Hideo Tsuchiya, et al, "Printability verification function of Mask Inspection System", Proc of SPIE Vol.7488, 74880B(2009).