SMO photomask inspection in the lithographic plane

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Gallagher, Emily ^a   Badger, Karen ^a   Kodera, Yutaka ^b   Azpiroz, Jaione Tirapu ^c   Graur, Ioana ^c   Halle, Scott D ^a   Lai, Kafai ^c   McIntyre, Gregory R ^a   Wihl, Mark J ^d   Chen, Shaoyun ^d   Cong, Ge ^d   Mu, Bo ^d   Guo, Zhian ^d   Dayal, Aditya ^d  

^a IBM   (United States)

^b Toppan Photomasks Inc   (United States)

^c IBM RESEARCH   (United States)

^d KLA TENCOR CORPORATION   (United States)

Author keywords

Aerial Plane Inspection (API); Lithography simulation; Source Mask Optimization (SMO)

Indexed keywords

AERIAL PLANE INSPECTION (API); CO-OPTIMIZATION; COMMON FEATURES; DESIGN FEATURES; DETECTION OF DEFECTS; FREQUENCY DOMAINS; ILLUMINATION SOURCES; INITIAL DESIGN; INSPECTION TECHNOLOGY; LITHOGRAPHY SIMULATION; MASK DEFECTS; MASK FEATURES; MASK INSPECTION; MASK OPTIMIZATION; MASK PATTERNS; SINGLE-MASK; SOURCE MASK OPTIMIZATION (SMO);

DEFECTS; DESIGN; INSPECTION; OPTIMIZATION;

PHOTOMASKS;

EID: 79959364535     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.830668     Document Type: Conference Paper

References (9)

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