Hybrid Hopkins-Abbe method for modeling oblique angle mask effects in OPC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Adam, Konstantinos ^a   Lam, Michael C ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

DDM; Domain decomposition method; HHA; Hybrid Hopkins Abbe method; Optical proximity correction

Indexed keywords

(E ,2E) THEORY; DIFFRACTION LIMITED; DOMAIN DECOMPOSITION (D-D); ELECTROMAGNETIC SCATTERING; HOPKINS; NEW METHODS; OBLIQUE ANGLES; OFF-AXIS-ILLUMINATION (OAI); OPTICAL MICRO LITHOGRAPHY; OPTICAL PROXIMITY CORRECTION (OPC); THIRD PARTIES; THROUGH PITCH;

CURVE FITTING; DOMAIN DECOMPOSITION METHODS; LITHOGRAPHY;

DIFFRACTION;

EID: 45449109797     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.776731     Document Type: Conference Paper

References (18)

1. K. Adam, Domain Decomposition Methods for the Electromagnetic Simulation of Scattering from Three-Dimensional Structures with Applications in Lithography, Electronics Research Laboratory, University of California, Berkeley, chapters 4 and 6, 2001.
2. K. Adam, A. R. Neureuther, "Simplified Models for Edge Transitions in Rigorous Mask Modeling", Proceedings of the SPIE, vol. 4346, pp. 331-344, 2001.
3. K. Adam, A. R. Neureuther, "Methodology for Accurate and Rapid Simulation of Large Arbitrary 2D Layouts of Advanced Photomasks, Proceedings of the SPIE, vol. 4562, pp. 1051-1067, 2002.
4. J. Tirapu-Azpiroz, P. Burchard, E. Yablonovitch, "Boundary Layer Model to Account for Thick Mask Effects in Photolithography", Proceedings of the SPIE, vol. 5040, pp. 1611-1619, 2003.
5. E. Abbe, "Beitrage zur Theorie des Mikroskops und der Mikroskopischen Wahrnehmung", Archiv. Microskopische Anat., vol. 9, pp. 413-468, 1873.
6. H. H. Hopkins, "On the Diffraction Theory of Optical Images", Proc. Roy. Soc. A217, pp. 408-432, 1953.
7. M. S. Yeung, D. Lee, R. Lee, A. R. Neureuther, "Extension of the Hopkins Theory of Partially Coherent Imaging to Include Thin-Film Interference Effects", Proceedings of the SPIE, vol. 1927, pp. 452-463, 1993.
8. Konstantinos Adam, Yuri Granik, Andres Torres, Nick Cobb, "Improved Modeling Performance with an Adapted Vectorial Formulation of the Hopkins Imaging Equation", Proceedings of the SPIE, vol. 5040, 2003.
9. R. M. von Bunau, Y. C. Pati, Y. Wang, R. F. W. Pease, "Optimal Coherent Decompositions for Radially Symmetric Optical Systems", J. Vac. Sci. Technol. B, vol. 15(6), pp. 2412-2416, Nov/Dec 1997.
10. Nicolas Bailey Cobb, Fast Optical and Process Proximity Correction Algorithms for Integrated Circuit Manufacturing, Ph.D. Dissertation, University of California, Berkeley, 1998.
11. Andreas Erdmann, Giuseppe Citarella, Peter Evanschitzky, Hans Schermer, Vicky Philipsen, Peter De Bisschop, "Validity of the Hopkins Approximation in Simulations of Hyper NA (NA>1) Line-Space Structures for an Attenuated PSM Mask", Proceedings of the SPIE, vol. 6154, 2006.
12. Mazen Saied, et al., "3D Mask Modeling with Oblique Incidence and Mask Corner Rounding Effects for the 32nm Node", Proceedings of the SPIE, vol. 6730, 2007.
13. Peng Liu, et al., "Fast and Accurate 3D Mask Model for Full-Chip OPC and Verification", Proceedings of the SPIE, vol. 6520, 2007.
14. http://www.panoramictech.com
15. http://www.mentor.com/products/ic_nanometer_design/mask_syn/calibre_opc/ index.cfm
16. T. V. Pistor, A. R. Neureuther, R. J. Socha, "Modeling Oblique Incidence Effects in Photomasks", Proceedings of the SPIE, vol. 4000, pp. 228-237, 2000.
17. T. Pistor, Electromagnetic Simulation and Modeling with Applications in Lithography, Ph.D. Dissertation, University of California, Berkeley, 2001.
18. R. J. Socha, Propagation Effects of Partially Coherent Light in Optical Lithography and Inspection, Ph.D. Dissertation, University of California, Berkeley, 1997, chapters 3 and 6.