Expanding the applications of computational lithography and inspection (CLI) in mask inspection, metrology, review, and repair

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7971, Issue , 2011, Pages

  Pang, Linyong ^a   Peng, Danping ^a   Hu, Peter ^a   Chen, Dongxue ^a   He, Lin ^a   Li, Ying ^a   Clifford, Chris ^a   Tolani, Vikram ^a  

^a Luminescent Technologies Inc   (United States)

Author keywords

Computation lithography; computational inspection; EUV; mask defect disposition; mask inspection; mask metrology; mask pattern recovery; mask repair

Indexed keywords

COMPUTATION LITHOGRAPHY; COMPUTATIONAL INSPECTION; EUV; MASK DEFECT DISPOSITION; MASK INSPECTION; MASK METROLOGY; MASK PATTERN RECOVERY; MASK REPAIR;

LITHOGRAPHY; MEASUREMENTS; PHOTOMASKS; PROCESS CONTROL; REPAIR; TECHNOLOGY; UNITS OF MEASUREMENT;

INSPECTION;

EID: 79956155832     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879535     Document Type: Conference Paper

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