Lithographic effects of mask critical dimension error

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 106-116

  Wong, Alfred K K ^a   Ferguson, Richard A ^a   Liebmann, Lars W ^a   Mansfield, Scott M ^a   Molless, Antoinette F ^a   Neisser, Mark O ^a  

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLIFICATION; PHOTORESISTS; PULSE MODULATION;

DEFECT PRINTABILITY; DIMENSION ERROR; ERROR AMPLIFICATION; FIELD LINES; HOLE PATTERNS; LOW CONTRAST; MASK ERROR FACTOR (MEF); MASK ERRORS; SPACE PATTERNS;

MASKS;

EID: 0010511790     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310718     Document Type: Conference Paper

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