Mask modeling in the low k1 and ultrahigh NA regime: Phase and polarization effects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Erdmann, Andreas ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

Lithography simulation; Mask polarization; Mask topography

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DIFFRACTIVE OPTICS; LIGHT POLARIZATION; LITHOGRAPHY; OPTICAL MATERIALS;

KIRCHHOFF APPROACH; LITHOGRAPHY SIMULATION; MASK POLARIZATION; MASK TOPOGRAPHY;

MASKS;

EID: 33644610334     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.637285     Document Type: Conference Paper

References (10)

1. Erdmann A.: Modeling and Simulation, in "Handbook of Mask Making Technology" ed. by S. Rizvi, Marcel Dekker, 2005.
2. D.G. Flagello, B. Arnold, S. Hansen, M. Dusa, R. J. Socha, J. Mulkens, and R. Garreis: Optical lithography in the sub-50-nm regime, Proc. SPIE 5377 (2004) 21.
3. B.W. Smith: Mutual optimization of resolution enhancement techniques, Journal of Microlithography, Microfabrication, and Microsystems 1 (2002) 95.
4. A. Estroff, Y. Fan, A. Bourov, Cropanese F.C., Lafferty N.V., Zavyalova L.V., and Smith B.W.: Mask-induced polarization, Proc. SPIE 5377 (2004) 1069.
5. A. Erdmann: Topography effects and wave aberrations in advanced PSM-technology, Proc. SPIE 4346 (2001) 345.
6. A. Erdmann and N. Kachwala: Enhancements in rigorous simulation of light diffraction from phase shift masks, Proc. SPIE 4691 (2002) 1156.
7. A.K. Wong and A. Neureuther: Edge Effects in Phase Shifting Masks for 0.25μm Lithography, Proc. SPIE 1809 (1992) 222.
8. C. Friedrich, L. Mader, A. Erdmann, S. List, R. Gordon, C. Kalus, U. Griesinger, R. Pforr, J. Mathuni, G. Ruhl and W. Maurer: Optimising edge topography of alternating phase shift masks using rigorous mask modelling, Proc SPIE 4000 (2000) 1323.
9. T.V. Pistor, A.R. Neureuther, and R.J. Socha: Modeling oblique incidence effects in photomasks, Proc. SPIE 4000 (2000) 228.
10. nd IISB Lithography Simulation Workshop, Hersbruck, September 2004.