Benefits and trade-offs of global source optimization in optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Tian, Kehan ^a   Krasnoperova, Azalia ^a   Melville, David ^b   Rosenbluth, Alan E ^b   Gil, Darío ^b   Tirapu Azpiroz, Jaione ^a   Lai, Kafai ^a   Bagheri, Saeed ^a   Chen, Chia Chen ^a   Morgenfeld, Bradley ^a  

^a IBM RESEARCH   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Pixelated source; RETs; Source mask optimization (SMO); Source optimization

Indexed keywords

ANALYSIS AND SIMULATION; CO-OPTIMIZATION; CURRENT RESOLUTION; GLOBAL SOURCES; OPTICAL LITHOGRAPHY; OPTIMAL SOLUTIONS; PIXELATED SOURCE; PROCESS WINDOW; RETS; SOURCE MASK OPTIMIZATION (SMO); SOURCE OPTIMIZATION; SRAM CELL; TOOL MATCHING;

GLOBAL OPTIMIZATION; MASKS; PHOTOLITHOGRAPHY;

OPTIMIZATION;

EID: 65849393679     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814305     Document Type: Conference Paper

References (7)

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2. Yuri Granik, "Source optimization for image fidelity and throughput," JM3, v.3, 509 (2004).
3. Robert Socha et al, "Simultaneous source mask optimization (SMO)," Proc. SPIE, v.5853,180 (2005).
4. A.E. Rosenbluth, and N. Seong, "Global Optimization of the Illumination Distribution to Maximize Integrated Process Window," SPIE v.6154 Optical Microlithography XIX (2006).
5. IBM Develops Computational Scaling Solution for Next Generation "22nm" Semiconductors, http://www-03.ibm.com/press/us/en/pressrelease/ 25147.wss.
6. K. Lai, et al, "Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22-nm logic lithography process," SPIE v. 7274 Optical Microlithography XXII (2009).
7. A.E. Rosenbluth, et al., "Intensive Optimization of Masks and Sources for 22nm Lithography," SPIE v. 7274 Optical Microlithography XXII (2009).