Considerations in source-mask optimization for logic applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Deng, Yunfei ^a   Zou, Yi ^a   Yoshimoto, Kenji ^a   Ma, Yuansheng ^a   Tabery, Cyrus E ^a   Kye, Jongwook ^a   Capodieci, Luigi ^a   Levinson, Harry J ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

cost function; design rule; illumination; lithography modeling; lithography simulation; low k1 factor; OPC; Optical lithography; pixelated source; resist blur; RET; SMO; source mask optimization; source optimization

Indexed keywords

COST FUNCTIONS; LIGHTING; PHOTOLITHOGRAPHY;

DESIGN RULES; LITHOGRAPHY MODELING; LITHOGRAPHY SIMULATION; LOW K1 FACTOR; OPC; PIXELATED SOURCE; RESIST BLUR; RET; SMO; SOURCE OPTIMIZATION; SOURCE-MASK OPTIMIZATIONS;

MASKS;

EID: 84905498020     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.848865     Document Type: Conference Paper

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