Imaging performance of production-worthy multiple-E-beam maskless lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7520, Issue , 2009, Pages

  Lin, S J ^a   Wang, W C ^a   Chen, Jack J H ^a   Krecinic, Faruk ^a   Lin, Burn J ^a   De Boer, Guido ^b   Slot, Erwin ^b   Jager, Remco ^b   Steenbrink, Stijn ^b   Kampherbeek, Bert Jan ^b   Wieland, Marco ^b  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b MAPPER Lithography BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CD UNIFORMITY; CMOS-MEMS; DATA PATHS; E-BEAM CURRENTS; E-BEAMS; HIGH PRODUCTIVITY; HIGH-SPEED; IMAGING PERFORMANCE; IMAGING TESTS; MASK-LESS LITHOGRAPHY; MASS PRODUCTION; OPTICAL DATA; POSSIBLE SOLUTIONS; POTENTIAL SOLUTIONS; RESIST IMAGING; WAFER STAGE; WRITING BEAMS;

LOGIC CIRCUITS; MACHINE TOOLS; PRODUCTION ENGINEERING; SWITCHING CIRCUITS; THROUGHPUT;

LITHOGRAPHY;

EID: 77952037448     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.838573     Document Type: Conference Paper

References (9)

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