Simplified models for edge transitions in rigorous mask modeling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 331-344

  Adam, Konstantinos ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Complex mask transmission function; Cross talk in phase shift masks; Diffraction order; Fourier spectrum; New method for scalar imaging; Phase shift mask modeling

Indexed keywords

COMPUTER SIMULATION; CROSSTALK; DIFFRACTION; ELECTROMAGNETIC FIELDS; IMAGING TECHNIQUES; PHASE SHIFT;

EDGE TRANSITIONS; RIGOROUS MASK MODELING;

MASKS;

EID: 0035759070     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435733     Document Type: Conference Paper

References (16)

1. th ed.), pp. 619-626.
2. US Patents 5,242,770 (Sep. 7, 1993) and 5,447,810 (Sep. 5, 1995) by J.F. Chen and J.A. Matthews.
3. C. Friedrich, L. Mader, A. Erdmann, et. al., "Optimising Edge Topography of Alternating Phase Shift Masks Using Rigorous Mask Modeling", Proc. SPIE, Vol. 4000.
4. nd ed.), pp. 55-58.
5. ibid., pp. 33-34.
6. S. Hotta, T. Pistor, K. Adam, A.R. Neureuther, "Effects of Shifter Edge Topography on Through Focus Performance", Proc. SPIE, Vol. 4186.
7. nd ed.), pp. 638-641.
8. M.D. Levenson, N.S.Viswanathan, R.A. Simpson, "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE Transactions on Electron Devices 29(1982), pp. 1828-1836.
9. C. Pierrat, A. Wong, S. Vaidya, "Phase-Shifting Mask Topography Effects on Lithographic Image Quality", IEDM Tech. Digest, pp. 53-56, 1992.
10. T. Pistor, Expanding the Simulation Capability of TEMPEST, Electronic Research Laboratory, University of California, Berkeley, 1997.
11. T. Pistor, A.R. Neureuther, R. Socha, "Modeling Oblique Incidence Effects in Photomasks", Proc. SPIE, Vol. 4000.
12. J.R. Sheats, B.W. Smith, Microlithography - Science and Technology, (Marcel-Dekker, 1998), ch. 3.
13. K. Toh, Two-Dimensional Images with Effects of Lens Aberrations in Optical Lithography, M.S. Thesis, University of California, Berkeley, 1988.
14. Wong, A., Rigorous Three-Dimensional Time-Domain Finite Difference Electromagnetic Simulation, Electronics Research Laboratory, University of California, Berkeley, 1994.
15. A. Wong, A.R. Neureuther, "Mask Topography Effects in Projection Printing of Phase Shift Masks", IEEE Transactions on Electron Devices 41(1994), pp. 895-902.
16. www.millennium.berkeley.edu.