Source-mask co-optimization (SMO) using level set methods

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Tolani, Vikram ^a   Hu, Peter ^a   Peng, Danping ^a   Cecil, Tom ^a   Sinn, Robert ^a   Pang, Linyong ^a   Gleason, Bob ^a  

^a Luminescent Technologies Inc   (United States)

Author keywords

32nm below; Depth of focus; DOF; Inverse Lithography Technology (ILT); Low k1; Mask error enhancement factor; MEEF; RET; Source mask optimization (SMO)

Indexed keywords

DEPTH OF FOCUS; DOF; INVERSE LITHOGRAPHY; LOW-K1; MASK ERROR ENHANCEMENT FACTOR; MEEF; RET; SOURCE MASK OPTIMIZATION (SMO);

COST FUNCTIONS; INVERSE PROBLEMS; LITHOGRAPHY; OPTIMIZATION; PHOTOMASKS; TECHNOLOGY;

NUMERICAL METHODS;

EID: 77952073969     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.833430     Document Type: Conference Paper

References (5)

1. Pang, L., Xiao, G., Tolani, V., Hu, P., Cecil, T., Dam T., Baik K. and Gleason, B., "Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)", Photomask Technology 2008, Proc. Vol. 7122 (2008).
2. Kim, B.G., Suh S.S., Kim B.S., Tolani, V., Dai G., Irby D., Wang K., Xiao G., Kim, D., Baik K., and Gleason, B., "Trade-off between Inverse Lithography Mask Complexity and Lithographic Performance", JPM09-7379-57 (2009).
3. Saleh, B.E.A. and S.I. Sayegh, "Reductions of errors of microphotographic reproductions by optical corrections of original masks", Optical Eng., Vol. 20, p. 781-784 (1981)
4. Nashold, K.M. and Saleh, B.E.A., "Image construction through diffraction-limited high-contrast imaging systems: an iterative approach", J. Opt. Soc. Am. A, vol. 2, p. 635 (1985)
5. Osher S. and Fedkiw R., "Level Set Methods and Dynamic Implicit Surfaces", Applied Mathematical Sciences Vol. 153, Springer-Verlag ISBN 0-397-95482-1 (2000)