A computational technique to optimally design in-situ diffractive elements: Applications to projection lithography at the resist resolution limit

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Feijóo, Gonzalo R ^a   Tirapu Azpiroz, Jaione ^b   Rosenbluth, Alan E ^c   Oberai, Assad A ^d   Mohan, Jayanth J ^d   Tian, Kehan ^b   Melville, David ^c   Gil, Dario ^c   Lai, Kafai ^b  

^a WOODS HOLE OCEANOGRAPHIC INSTITUTION   (United States)

^b IBM   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

^d RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

Adjoint equations; Computational lithography; Double patterning; Holographic interferometry; Inverse lithography; Near field; Optimization; Talbot self imaging

Indexed keywords

ADJOINT EQUATIONS; COMPUTATIONAL LITHOGRAPHY; DOUBLE PATTERNING; INVERSE LITHOGRAPHY; NEAR-FIELD; TALBOT SELF-IMAGING;

HOLOGRAMS; IMAGE ENHANCEMENT; INTERFEROMETERS; NUMERICAL METHODS; OPTICAL DESIGN; OPTIMIZATION; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES; WAVEFRONTS;

HOLOGRAPHIC INTERFEROMETRY;

EID: 65849124054     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814251     Document Type: Conference Paper

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