A systematic study of source error in source mask optimization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7823, Issue PART 1, 2010, Pages

  Alleaume, C ^a   Yesilada, E ^a   Farys, V ^a   Depre, L ^b   Arnoux, V ^b   Li, Zhipan ^b   Trouiller, Y ^c   Serebryakov, A ^d  

^a STMICROELECTRONICS   (France)

^b Brion Technologies Inc   (United States)

^c CEA LETI   (France)

^d ASML   (Netherlands)

Author keywords

Degraded source; Freeform; Parametric; PV band; SMO; Source error; Source mask optimization

Indexed keywords

DEGRADED SOURCE; FREEFORMS; PARAMETRIC; PV BAND; SMO; SOURCE ERROR; SOURCE MASK OPTIMIZATION;

LITHOGRAPHY; PHOTOMASKS;

OPTIMIZATION;

EID: 78649826203     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.864246     Document Type: Conference Paper

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