Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32 nm

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 6, Issue 3, 2007, Pages

  Zhang, Qiaolin ^a   Lucas, Kevin ^a   Van Adrichem, Paul ^a   Tyminski, Jacek ^b   Gordon, Joseph S ^c  

^a SYNOPSYS INC   (United States)

^b NIKON PRECISION INC   (United States)

^c Toppan Photomask   (United States)

Author keywords

Lens apodization; Low pass filter models; OPC modeling; OPC verification; Optical proximity correction (OPC); Pellicles; Transmission attenuation

Indexed keywords

CONTROL SYSTEMS; LITHOGRAPHY; LOW PASS FILTERS; MATHEMATICAL MODELS; NATURAL FREQUENCIES;

LENS APODIZATION; OPTICAL PROXIMITY CORRECTION (OPC);

LENSES;

EID: 40049107566     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2783418     Document Type: Article

References (9)