A study of source & mask optimization for ArF scanners

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Matsuyama, Tomoyuki ^a   Nakashima, Toshiharu ^a   Noda, Tomoya ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Mask; Microlithography; Optimization; Process window; Source

Indexed keywords

ACTIVE TECHNIQUES; ARF EXPOSURE TOOL; ARF SCANNER; CUSTOMIZED ILLUMINATION; FEATURE GENERATION; FREEFORMS; ILLUMINATION SETTINGS; IMAGING PARAMETERS; MASK OPTIMIZATION; MICROLITHOGRAPHY; OPTICAL ELEMENTS; PERFORMANCE CAPABILITY; PROCESS WINDOW; SOURCE;

LITHOGRAPHY; OPTOELECTRONIC DEVICES; WINDOWS;

CONSTRAINED OPTIMIZATION;

EID: 65849395421     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813400     Document Type: Conference Paper

References (2)

1. A. Rosenbluth et al.,"Optimum Mask and Source Patterns to Print a Given Shape," Proc. SPIE, 2001, Vol.4346
2. [2] J. Tyminski et al.,"Scanner-characteristics-aware OPC modeling and correction," Proc. SPIE, 2007, Vol.6521 (Pubitemid 47551345)