SCOPUS 정보 검색 플랫폼

Volumn 3, Issue 2, 2004, Pages 263-268

Effects of reticle reflectance on lithography

Author keywords

Chrome absorber; Mask reflectivity; Reticle absorber; Reticle reflectivity

Indexed keywords

CHROME ABSORBER; MASK REFLECTIVITY; RETICLE ABSORBER; RETICLE REFLECTIVITY;

IMAGE PROCESSING; LIGHT ABSORPTION; LIGHT REFLECTION; OPTIMIZATION; QUARTZ; SCANNING ELECTRON MICROSCOPY; STRESS ANALYSIS;

LITHOGRAPHY;

EID: 2542491486 PISSN: 15371646 EISSN: None Source Type: Journal
DOI: 10.1117/1.1668268 Document Type: Article

Times cited : (2)

References (5)

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- Smith, K.H.¹ Wasson, J.R.² Mangat, P.J.S.³ Dauksher, W.J.⁴ Resnick, D.J.⁵

3
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- W. J. Dauksher, D. J. Resnick, S. B. Clemens, D. L. Standfast, Z. S. Masnyj, J. R. Wasson, N. M. Bergmann, S.-I. Han, and P. J. S. Mangat, J. Vac. Sci. Technol. B, 18(6), 3232 (2000).
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- Dauksher, W.J.¹ Resnick, D.J.² Clemens, S.B.³ Standfast, D.L.⁴ Masnyj, Z.S.⁵ Wasson, J.R.⁶ Bergmann, N.M.⁷ Han, S.-I.⁸ Mangat, P.J.S.⁹

4
- 85076473652
- Scattered light in photolithographic lenses
- J. P. Kirk, "Scattered light in photolithographic lenses," Proc. SPIE, 2197, 566-572 (1994).
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- Kirk, J.P.¹

5
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- P. S. Hauge, J. Opt. Soc. Am., 69, 1143 (1979).
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.