Design compliant Source Mask Optimization (SMO)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7748, Issue , 2010, Pages

  Socha, Robert ^a   Jhaveri, Tejas ^b   Dusa, Mircea ^a   Liu, Xiaofeng ^a   Chen, Luoqi ^a   Hsu, Stephen ^a   Li, Zhipan ^a   Strojwas, Andrzej J ^b  

^a ASML US Inc   (United States)

^b PDF Solutions   (United States)

Author keywords

Design fabric; Design source mask optimization; Design template; SMO; Source mask optimization

Indexed keywords

BRIGHT FIELDS; CO-OPTIMIZATION; COLOR SCHEMES; CONTACT HOLES; CONTACT LAYERS; DOUBLE PATTERNING; FABRIC DESIGN; FASTER CONVERGENCE; FEED-BACK LOOP; FLEXRAY; LITHOGRAPHIC PROCESS; LOGIC NODES; MASK OPTIMIZATION; PROCESS WINDOW; SMO; SRAM CELL;

CAPACITANCE; DESIGN; FABRICS; OPTIMIZATION; STATIC RANDOM ACCESS STORAGE;

MASKS;

EID: 77954419865     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.865781     Document Type: Conference Paper

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