Control of polarization and apodization with film materials on photomasks and pellicles for high NA imaging performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Cheng, Wen Hao ^a   Farnsworth, Jeff ^a  

^a INTEL CORPORATION   (United States)

Author keywords

ArF immersion lithography; Film material; High NA; Imaging contrast; Mask polarization; Pellicle apodization

Indexed keywords

DIFFRACTION PATTERNS; IMAGE PROCESSING; IMAGING TECHNIQUES; LITHOGRAPHY; OPTICS; OPTIMIZATION; PHOTOMASKS; POLARIZATION;

FILM MATERIALS; KIRCHHOFF BOUNDARY CONDITIONS; MASK POLARIZATIONS; PELLICLE APODIZATIONS;

OPTICAL FILMS;

DIFFRACTION; LITHOGRAPHY; OPTICS; OPTIMIZATION; POLARIZATION;

EID: 35148845171     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712424     Document Type: Conference Paper

References (5)

1. W.H. Cheng et al, "Vectorial effects in sub-wavelength mask imaging", Proc. SPIE Vol. 5992, 599218, 2005.
2. W.H. Cheng et al, "Mask absorber material dependence of 2D OPC in 193nm high NA lithography", 22nd European Mask and Lithography Conference, 2006.
3. W.H. Cheng et al, "Deep sub-wavelength mask assist features and mask errors printability in high NA lithography", Proc. SPIE 6349, 63494W, 2006.
4. W.H. Cheng et al, "Scalability of subwavelength mask imaging for ArF immersion lithography", 2nd International Symposium on Immersion Lithography, 2005.
5. K. Bubke et al, "Pellicle-induced aberrations and apodization in hyper-NA optical lithography", Proc. SPIE 6283, 628318. 2006.