Photomask registration and overlay metrology by means of 193 nm optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Klose, Gerd ^a   Kerwien, Norbert ^a   Arnz, Michael ^a   Beyer, Dirk ^a   Rosenkranz, Norbert ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

Imaging performance; Optical design; Pattern placement; Registration metrology; Resolution

Indexed keywords

193-NM LITHOGRAPHIES; 32NM NODES; AT WAVELENGTHS; CD MEASUREMENTS; CD METROLOGIES; CURRENT STATUS; DESIGN AND BUILDS; DESIGN CONSIDERATIONS; DESIGN FEATURES; DOUBLE PATTERNING; IMAGING PERFORMANCE; IMAGING SIMULATIONS; METROLOGY TOOLS; OPTICAL CONCEPTS; OVERLAY METROLOGIES; PATTERN PLACEMENT; PERFORMANCE SPECIFICATIONS; PROCESS OPERATIONS; REGISTRATION METROLOGY; RESOLUTION; ROAD MAPS; SEMICONDUCTOR INDUSTRIES; SHORT WAVELENGTHS; WORKING DISTANCES;

DATA STORAGE EQUIPMENT; LIGHT; OPTICAL DESIGN; PHOTOMASKS; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGICAL FORECASTING;

MEASUREMENTS;

EID: 62649143643     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801077     Document Type: Conference Paper

References (8)

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4. Enkrich et al, "Registration Measurement Capability of Vistec LMS IPR04 with Focus on Small Features," Photomask and Next-Generation Lithography Mask Technology XV, Proceedings of SPIE Vol. 7028
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