Lithography aware design optimization using ILT

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7974, Issue , 2011, Pages

  Jeong, Jaeyoon ^a   Jeong, Seokyun ^a   Ahn, Changhoon ^a   Jang, Yongsun ^a   Lee, Sukjoo ^a   Cecil, Thomas ^b   Son, Donghwan ^b   Chow, Tatung ^b   Kim, David ^b  

^a SAMSUNG Electronics   (South Korea)

^b Luminescent Technologies Inc   (United States)

Author keywords

Design optimization; DFM; ILT; Layout optimization; OPC

Indexed keywords

DESIGN OPTIMIZATION; DFM; ILT; LAYOUT OPTIMIZATION; OPC;

INTEGRATION; MACHINE DESIGN; MASKS;

OPTIMIZATION;

EID: 79955867392     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879393     Document Type: Conference Paper

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