Using FlexRay in computational lithography

Japanese Journal of Applied Physics

Volumn 50, Issue 6 PART 2, 2011, Pages

  Socha, Robert ^a   Shao, Wenjin ^a,b   Van Dommelen, Youri ^a   Oorschot, Dorothe ^a,c   Meggens, Henry ^a,c   Vellanki, Venu ^a,b   Van Adrichem, Paul ^a,c   Xie, Xu ^a,b   Gau, Justin ^a,b   Aldana, Rafael ^a,b   Du, Fei ^a,b   Goossens, Ronald ^a,b   Yu, Zongchang ^a,b   Reijnen, Liesbeth ^a,c   Knops, Roel ^a,c   Schreel, Koen ^a,c   Hsu, Stephen ^a   Chen, Luoqi ^a   Gronlund, Keith ^a  

^a ASML US Inc   (United States)

^b Brion Technologies Inc   (United States)

^c ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ARF SCANNER; C-QUAD ILLUMINATION; CD ERRORS; CONTACT HOLE ARRAYS; CRITICAL DIMENSION; DOSE OPTIMIZATION; FLEXRAY; INTRAFIELD; MASK MANUFACTURING; MASK OPTIMIZATION; PROCESS WINDOW; ROOT MEAN SQUARE; SOURCE OPTIMIZATION; STATIC RANDOM ACCESS MEMORY;

DIFFRACTIVE OPTICAL ELEMENTS; MASKS; OPTIMIZATION; SCANNING;

STATIC RANDOM ACCESS STORAGE;

EID: 79959476811     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.06GB01     Document Type: Article

References (12)

1. M. Mulder, A. Engelen, O. Noordman, R. Kazinczi, G. Streutker, B. van Drieenhuizen, S. Hsu, K. Gronlund, M. Degünther, D. Jürgens, J. Eisenmenger, M. Patra, and A. Major: Proc. SPIE 7520 (2009) 75200Y.
2. A. Rosenbluth: J. Micro/Nanolithogr. MEMS MOEMS 1 (2002) 13.
3. R. Socha, X. Shi, and D. LeHoty: Proc. SPIE 5853 (2005) 180.
4. S. Hsu, L. Chen, Z. Li, S. Park, K. Gronlund, H. Liu, N. Callan, R. Socha, and S. Hansen: Proc. SPIE 7140 (2008) 714010.
5. Y. He, E. Byers, S. Light, D. Hines, A. Devilliers, M. Hyatt, J. Zhou, V. Nair, Z. Yu, Y. Cao, X. Xie, W. Shao, R. Aldana, R. Goossens, C.-Q. Ma, J. Lu, H.-Y. Liu, C. Aquino, P. Engblom, T. Nooitgedagt, and E. Janda: Proc. SPIE 7640 (2008) 764014.
6. J. Bekaert, B. Laenens, S. Verhaegen, L. Van Look, D. Trivkovic, F. Lazzarino, G. Vandenberghe, P. van Adrichem, R. Socha, S. Baron, M. C. Tsai, K. Ning, S. Hsu, H. Y. Liu, M. Mulder, A. Bouma, E. van der Heijden, O. Mouraille, K. Schreel, J. Finders, M. Dusa, J. Zimmermann, P. Gräupner, J. T. Neumann, and C. Hennerkes: Proc. SPIE 7640 (2010) 764008.
7. L. Van Look, J. Bekaert, V. Truffert, V. Wiaux, F. Lazzarino, M. Maenhoudt, G. Vandenberghe, M. Reybrouck, and S. Tarutani: Proc. SPIE 7640 (2010) 764011.
8. K. J. Seo, J. Miller, K. Park, M. Kim, S. C. Kim, J. Shin, C. Kim, A. Dayal, and T. Hutchinson: Proc. SPIE 7748 (2010) 77480N.
9. J. van Schoot, O. Noordman, P. Vanoppen, F. Blok, D. Yim, C. H. Park, B. H. Cho, T. Theeuwes, and Y. H. Min: Proc. SPIE 4691 (2002) 304.
10. C. A. Mack: Proc. SPIE 4000 (2000) 215.
11. N. A. Kurd, S. Bhamidipati, C. Mozak, J. L. Miller, T. Wilson, M. Nemani, and M. Chowdhury: Solid-State Circuits Conf. Dig. Tech. Pap. (ISSCC), 2010, p. 117.
12. R. Socha, M. Dusa, X. Liu, L. Chen, S. Hsu, Z. Li, T. Jhaveri, and A. J. Strojwas: Proc. SPIE 7748 (2010) 77480T.