Computational inspection applied to a mask inspection system with advanced aerial imaging capability

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7638, Issue , 2010, Pages

  Pang, Linyong ^a   Peng, Danping ^a   He, Lin ^a   Chen, Dongxue ^a   Dam, Thuc ^a   Tolani, Vikram ^a   Tam, Aviram ^b   Staud, Wolf ^b  

^a Luminescent Technologies Inc   (United States)

^b Applied Materials Inc Israel   (Israel)

Author keywords

aerial image; Computational Inspection; Computational Lithography; fusion inspection; Inverse Lithography Technology (ILT); mask defect disposition; mask inspection; mask pattern inversion; mask pattern reconstruction; mask pattern recovery

Indexed keywords

AERIAL IMAGES; COMPUTATIONAL INSPECTION; COMPUTATIONAL LITHOGRAPHY; INVERSE LITHOGRAPHY; MASK DEFECT DISPOSITION; MASK INSPECTION; MASK PATTERN INVERSION; MASK PATTERN RECONSTRUCTION; MASK PATTERN RECOVERY;

COMPUTER SIMULATION; COMPUTER SOFTWARE; INSPECTION EQUIPMENT; MASKS; NUMERICAL METHODS; PHOTORESISTS; PROCESS CONTROL; RECOVERY; UNITS OF MEASUREMENT;

INSPECTION;

EID: 78649833107     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848615     Document Type: Conference Paper

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