SMO for 28-nm logic device and beyond: Impact of source and mask complexity on lithography performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Nagahara, Seiji ^a   Yoshimochi, Kazuyuki ^a   Yamazaki, Hiroshi ^a   Takeda, Kazuhiro ^a   Uchiyama, Takayuki ^a   Hsu, Stephen ^b   Li, Zhipan ^b   Liu, Hua Yu ^b   Gronlund, Keith ^b   Kurosawa, Terunobu ^b   Ye, Jun ^b   Chen, Luoqi ^b   Chen, Hong ^b   Li, Zheng ^b   Liu, Xiaofeng ^b   Liu, Wei ^b  

^a RENESAS TECHNOLOGY CORP   (Japan)

^b ASML US Inc   (United States)

Author keywords

co optimization; diffractive optical element (DOE); FlexRay; freeform source; freeform SRAF; mask; programmable illuminator; source mask optimization (SMO); standard DOE

Indexed keywords

DENSITY (OPTICAL); DIFFRACTIVE OPTICAL ELEMENTS; LOGIC DEVICES;

CO-OPTIMIZATION; FLEXRAY; FREEFORMS; PROGRAMMABLE ILLUMINATOR; SOURCE-MASK OPTIMIZATIONS;

MASKS;

EID: 84905449687     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.846473     Document Type: Conference Paper

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