Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Lai, Kafai ^a   Rosenbluth, Alan E ^b   Bagheri, Saeed ^a   Hoffnagle, John ^c   Tian, Kehan ^a   Melville, David ^b   Tirapu Azpiroz, Jaione ^a   Fakhry, Moutaz ^h   Kim, Young ^c   Halle, Scott ^a   McIntyre, Greg ^a   Wagner, Alfred ^b   Burr, Geoffrey ^c   Burkhardt, Martin ^b   Corliss, Daniel ^a   Gallagher, Emily ^d   Faure, Tom ^d   Hibbs, Michael ^d   Fiagello, Donis ^e   Zimmermann, Joerg ^f   Kneer, Bernhard ^f   Rohmund, Frank ^f   Hartung, Frank ^f   Hennerkes, Christoph ^f   Maul, Manfred ^f   Kazinczi, Robert ^g   Engelen, Andre ^g   Carpaij, Rene ^g   Groenendijk, Remco ^g   Hageman, Joost ^g   more..

^a IBM MICROELECTRONICS   (United States)

^b IBM RESEARCH   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

^d IBM   (United States)

^e ASML US Inc   (United States)

^f CARL ZEISS SMT AG   (Germany)

^g ASML   (Netherlands)

^h MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Diffractive optical elements; Logic lithography; Low kl factor; Mask; Mask inspection; Optical lithography; Pixelated source; Simulation; SMO; Source mask optimization; Source optimization

Indexed keywords

LOGIC LITHOGRAPHY; LOW KL FACTOR; MASK INSPECTION; OPTICAL LITHOGRAPHY; PIXELATED SOURCE; SIMULATION; SMO; SOURCE MASK OPTIMIZATION; SOURCE OPTIMIZATION;

DENSITY (OPTICAL); DIFFRACTIVE OPTICAL ELEMENTS; INSPECTION; OPTIMIZATION; PHOTOLITHOGRAPHY;

MASKS;

EID: 65849458771     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814680     Document Type: Conference Paper

References (6)

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3. A. E. Rosenbluth et al, "Optimum Mask and Source pattern to print a given shape", JM3, no. 1, p.13 (2002)
4. A. E. Rosenbluth, N. Seong, "Global optimization of the illumination distribution to optimize integrated process window", Proc. SPIE vol. 6154, (2006).
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6. D. G. Fiagello, B. Geh, R Socha, P. Liu, Y. Cao, R. Stas, O. Natt, J. Zimmermann, "Understanding Illumination effects for control of Optical Proximity Effects (OPE)", Proc. SPIE vol. 6924, (2008)