메뉴 건너뛰기




Volumn 5377, Issue PART 3, 2004, Pages 1528-1535

Fast evaluation of photomask near-fields in sub-wavelength 193nm lithography

Author keywords

Aerial image simulation; Deep Ultraviolet Lithography; Kirchhoff Boundary Conditions; Phase shifting Masks; Photomask Near Field; Thick mask; Thin mask model

Indexed keywords

AERIAL IMAGE SIMULATION; DEEP ULTRAVIOLET (DUV) LITHOGRAPHY; KIRCHOFF BOUNDARY CONDITIONS; PHASE-SHIFTING MASKS; PHOTOMASK NEAR-FIELD; THE MASK MODEL; THICK MASKS;

EID: 3843104611     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.544236     Document Type: Conference Paper
Times cited : (18)

References (14)
  • 2
    • 0034258866 scopus 로고    scopus 로고
    • Limitation of the kirchhoff boundary conditions for aerial image simulation in 157 nm optical lithography
    • Sep
    • M. S. Yeung and E. Barouch, "Limitation of the kirchhoff boundary conditions for aerial image simulation in 157 nm optical lithography," IEEE Electron Device Lett. 21 No 9, pp. 433-435, Sep. 2000.
    • (2000) IEEE Electron Device Lett. , vol.21 , Issue.9 , pp. 433-435
    • Yeung, M.S.1    Barouch, E.2
  • 3
    • 0141610771 scopus 로고    scopus 로고
    • 1 effects versus mask topography effects
    • 1 effects versus mask topography effects," Proceedings of the SPIE 5040, pp. 193-202, 2003.
    • (2003) Proceedings of the SPIE , vol.5040 , pp. 193-202
    • Pierrat, C.1    Wong, A.2
  • 4
    • 18744367218 scopus 로고    scopus 로고
    • Lithography strategy for 65nm node
    • Y. Borodovsky and et. al., "Lithography strategy for 65nm node," Proceedings of the SPIE 4346, 2002.
    • (2002) Proceedings of the SPIE , vol.4346
    • Borodovsky, Y.1
  • 5
    • 0035759070 scopus 로고    scopus 로고
    • Simplified models for edge transitions in rigorous mask modeling
    • K. Adam and A. R. Neureuther, "Simplified models for edge transitions in rigorous mask modeling," Proc. of the SPIE 4346 pt.1-2, pp. 331-344, 2001.
    • (2001) Proc. of the SPIE , vol.4346 , Issue.PART 1-2 , pp. 331-344
    • Adam, K.1    Neureuther, A.R.2
  • 6
    • 0035768220 scopus 로고    scopus 로고
    • Understanding bossung curve asymmetry and focus shift effect in euv lithography
    • P.-Y. Yan, "Understanding bossung curve asymmetry and focus shift effect in euv lithography," Proc. of SPIE 4562, pp. 1-9, 2001.
    • (2001) Proc. of SPIE , vol.4562 , pp. 1-9
    • Yan, P.-Y.1
  • 7
    • 0141609989 scopus 로고    scopus 로고
    • Domain decomposition methods for simulation of printing and inspection of phase defects
    • M. Lam, K. Adam, and A. Neureuther, "Domain decomposition methods for simulation of printing and inspection of phase defects," Proceedings of the SPIE 5040, pp. 1492-1501, 2003.
    • (2003) Proceedings of the SPIE , vol.5040 , pp. 1492-1501
    • Lam, M.1    Adam, K.2    Neureuther, A.3
  • 8
    • 0141609913 scopus 로고    scopus 로고
    • Boundary layer model to account for thick mask effects in photolithography
    • J. Tirapu-Azpiroz, P. Burchard, and E. Yablonovitch, "Boundary layer model to account for thick mask effects in photolithography," Proceedings of the SPIE 5040, pp. 1611-1619, 2003.
    • (2003) Proceedings of the SPIE , vol.5040 , pp. 1611-1619
    • Tirapu-Azpiroz, J.1    Burchard, P.2    Yablonovitch, E.3
  • 10
    • 0141610839 scopus 로고    scopus 로고
    • Improved modeling performance with an adapted vectorial formulation of the hopkins imaging equation
    • K. Adam, Y. Granik, A. Torres, and N. Cobb, "Improved modeling performance with an adapted vectorial formulation of the hopkins imaging equation," Proceedings of the SPIE 5040, pp. 78-90, 2003.
    • (2003) Proceedings of the SPIE , vol.5040 , pp. 78-90
    • Adam, K.1    Granik, Y.2    Torres, A.3    Cobb, N.4
  • 11
    • 33744825516 scopus 로고    scopus 로고
    • Modeling of near-field effects in sub-wavelength deep ultraviolet lithography
    • To appear in S. Luryi, J. Xu, and A. Zaslavsky, eds., Wiley Interscience
    • J. Tirapu-Azpiroz and E. Yablonovitch, "Modeling of near-field effects in sub-wavelength deep ultraviolet lithography," To appear in Future Trends of Microelectronics 2003, S. Luryi, J. Xu, and A. Zaslavsky, eds., Wiley Interscience.
    • Future Trends of Microelectronics 2003
    • Tirapu-Azpiroz, J.1    Yablonovitch, E.2
  • 12
    • 0019625681 scopus 로고
    • Conditions for the validity of the debye integral representation of focused fields
    • E. Wolf and Y. Li, "Conditions for the validity of the debye integral representation of focused fields," Optics Communications 39, No 4, pp. 205-210, 1981.
    • (1981) Optics Communications , vol.39 , Issue.4 , pp. 205-210
    • Wolf, E.1    Li, Y.2
  • 13
    • 0001846054 scopus 로고    scopus 로고
    • Theory of high-na imaging in homogeneous thin films
    • D. G. Flagello, T. Milster, and A. E. Rosenbluth, "Theory of high-na imaging in homogeneous thin films," J. Opt. Soc. Am. A 13, No 1, pp. 53-64, 1996.
    • (1996) J. Opt. Soc. Am. A , vol.13 , Issue.1 , pp. 53-64
    • Flagello, D.G.1    Milster, T.2    Rosenbluth, A.E.3
  • 14
    • 0029403880 scopus 로고
    • Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications
    • Nov
    • A. K. Wong and A. R. Neureuther, "Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications," IEEE Trans. on Semiconductor Manufacturing 8, No 4, pp. 419-431, Nov. 1995.
    • (1995) IEEE Trans. on Semiconductor Manufacturing , vol.8 , Issue.4 , pp. 419-431
    • Wong, A.K.1    Neureuther, A.R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.