Extreme ultraviolet lithography: Status and prospects

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2204-2207

  Benschop, Jos ^a   Banine, Vadim ^a   Lok, Sjoerd ^a   Loopstra, Erik ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; LASER PULSES; LIGHT SOURCES; PHOTOLITHOGRAPHY; SEMICONDUCTOR MATERIALS; ULTRAVIOLET DEVICES;

193NM IMMERSION LITHOGRAPHIES; BELGIUM; DIFFUSION LENGTHS; EUV IMAGING; EUV SOURCES; EXTREME ULTRAVIOLETS; HIGH PRODUCTIVITIES; HIGH RESOLUTIONS; IMAGING CAPABILITIES; LESSONS LEARNED; POTENTIAL SOLUTIONS; PROJECTION LITHOGRAPHIES; SEMI-CONDUCTORS; SEMICONDUCTOR CHIPS; STATUS AND PROSPECTS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

COST EFFECTIVENESS; IMAGE ANALYSIS; LIGHT SOURCES; LITHOGRAPHY; MASKING; RESISTIVITY; SHRINKAGE;

EID: 57249094101     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3010737     Document Type: Article

References (11)

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