Considering MEEF in Inverse Lithography Technology (ILT) and source mask optimization (SMO)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Pang, Linyong ^a   Xiao, Guangming ^a   Tolani, Vikram ^a   Hu, Peter ^a   Cecil, Tom ^a   Dam, Thuc ^a   Baik, Ki Ho ^a   Gleason, Bob ^a  

^a Luminescent Technologies Inc   (United States)

Author keywords

ILT; Inverse Lithography Technology; MEEF; RET; SMO; Source mask optimization; SRAF

Indexed keywords

ILT; INVERSE LITHOGRAPHY TECHNOLOGY; MEEF; RET; SMO; SOURCE MASK OPTIMIZATION; SRAF;

OPTIMIZATION; PHOTOLITHOGRAPHY; TECHNOLOGY;

MASKS;

EID: 62649092944     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.803801     Document Type: Conference Paper

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