Rigorous mask modeling using waveguide and FDTD methods: An assessment for typical hyper NA imaging problems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Erdmann, Andreas ^a   Evanschitzky, Peter ^a   Citarella, Giuseppe ^a   Fühner, Tim ^a   De Bisschop, Peter ^b  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b IMEC   (Belgium)

Author keywords

Finite difference time domain method; Mask topography; Rigorous mask modeling; Waveguide method

Indexed keywords

DATA STORAGE EQUIPMENT; FINITE DIFFERENCE METHOD; OPTICAL WAVEGUIDES; PROGRAM PROCESSORS; TIME DOMAIN ANALYSIS;

AERIAL IMAGES; MASK TOPOGRAPHY; RIGOROUS MASK MODELING; WAVEGUIDE METHOD;

MASKS;

EID: 33748075476     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681872     Document Type: Conference Paper

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