Source-mask optimization (SMO): From theory to practice

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Dam, Thuc ^a   Tolani, Vikram ^a   Hu, Peter ^a   Baik, Ki Ho ^a   Pang, Linyong ^a   Gleason, Bob ^a   Slonaker, Steven D ^b   Tyminski, Jacek K ^b  

^a Luminescent Technologies Inc   (United States)

^b NIKON PRECISION INC   (United States)

Author keywords

ILT; Jones pupil aberrations; OPC; optical aberrations; scanner aberrations; SMO; Zernike aberrations

Indexed keywords

ABERRATIONS; SCANNING;

ILT; JONES PUPILS; OPC; SMO; ZERNIKE ABERRATIONS;

MASKS;

EID: 84255176085     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.848257     Document Type: Conference Paper

References (2)

1. Daniel Abrams and Lingyong Pang, Fast Inverse Lithography Technology, Proceedings of the S.P.I.E. 6154-55, 2006
2. Daniel Abrams, Danping Peng, and Stanley Osher, Method or Time-Evolving Rectilinear Contours Representing Photo Masks, U.S. Patent 7, 124, 394, 2006