Towards ultimate optical lithography with NXT:1950i dual stage immersion platform

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Castenmiller, Tom ^a   Van De Mast, Frank ^a   De Kort, Toine ^a   Van De Vin, Coen ^a   De Wit, Marten ^a   Stegen, Raf ^a   Van Cleef, Stefan ^a  

^a ASML   (Netherlands)

Author keywords

22 nm; 32 nm; Double patterning; Exposure System; immersion lithography; Overlay; Throughput

Indexed keywords

LINEAR MOTORS; MASKS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; PRODUCTIVITY; SCANNING; THROUGHPUT;

22-NM; 32-NM; DOUBLE PATTERNING; EXPOSURE SYSTEM; IMMERSION LITHOGRAPHY; OVERLAY;

ALIGNMENT;

EID: 84905491972     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.847025     Document Type: Conference Paper

References (11)

1. André Engelen, Igor Bouchoms, Andre Engelen, Jan Mulkens, Herman Boom, Richard Moerman, Paul Liebregts, Roelof de Graaf, Marieke van Veen, Patrick Thomassen, Wolfgang Emera and Frank Sperling, Extending Single- Exposure Patterning Towards 38-nm Half-Pitch using 1.35 NA Immersion, SPIE 2009 proceedings 7274-56.
2. Chiew-seng Koay, Steven Holmes, Karen Petrillo, Kuang-Jung Chen, Matthew Colburn (IBM), Youri von Dommelen, Michael Crouse, Aiqin Jiang, Michael Many, Robert Routh (ASML Albany), Jason Cantoneb, David Hetzer, Kenichi Uedab, Andrew Metzc ,Shannon Dunn (TEL), Cherry Tang, Mark Slezak (JSR), Michael Reilly, Vaishali Vohra (DOW) Sumanth Kini, Tony Dibiase (KLA), Evaluation of Double Exposure Processes for Advanced Logic Nodes. To be published SPIE 2010 proceedings
3. Fred de Jong, Bert van der Pasch, Tom Castenmiller, Bert Vleeming, Richard Droste, Frank van de Mast, Enabling the lithography roadmap: an immersion tool based on a Novel Stage Positioning System, SPIE 2009 proceedings 7274-64.
4. Igor Bouchoms, Jan Mulkens, Sander de Putter, Pieter Gunter, Roelof de Graaf, Marcel Beems, Erwin Verdurmen, Hans Jasper, Frank Bornebroek (ASML), Nils Dieckmann (CARL ZEISS), Advanced imaging with 1.35 NA immersion systems for volume production, to be published SPIE 2010 proceedings
5. Jo Finders, Mircea Dusa, Bert Vleeming, Henry Megens, Birgitt Hepp, Mireille Maenhoudt, Shaunee Cheng, and Tom Vandeweyer, "Double patterning for 32nm and below: an update", Proc. SPIE 6924, 692408 (2008), DOI:10.1117/12.772780
6. H.Tanaka, K. Hoshiko, T. Shimokawa, H.F. Hoefnagels, D.E Keller, S. Wang, O. Tanriseven, R. Maas and J. Mallmann, K. Shigemori, C. Rosslee, Simplified - "Litho-Cluster-Only" - Solution for Double Patterning, Proc. SPIE 7639-81, to be published (2010).
7. Mircea Dusa, Bill Arnold, Jo Finders, Hans Meiling, Koen van Ingen Schenau, and Alek C. Chen, "The lithography technology for the 32 nm HP and beyond", Proc. SPIE 7028, 702810 (2008), DOI:10.1117/12.796016
8. Goji Wakamatsu, Yusuke Anno, Masafumi Hori, Tomohiro Kakizawa, Michihiro Mita, Kenji Hoshiko, Takeo Shioya, Koichi Fujiwara, Shiro Kusumoto, Yoshikazu Yamaguchi, and Tsutomu Shimokawa, "Double patterning process with freezing technique", Proc. SPIE 7273, 72730B (2009), DOI:10.1117/12.814073
9. Melchior Mulder et all, Performance of FlexRay:a fully programmable illumination system for generation of freeform sources on high-NA immersion systems, SPIE proceedings 7640-59, 2010, to be published.
10. Gerald Dicker: GID Double Patterning and Double Exposure CDU Models, internal ASML publication.
11. Jo Finders et all, Litho &patterning challenges for memory and logic applications at the 22-nm node, SPIE 2010 proceedings 7640-11.