Optimum mask and source patterns to print a given shape

Journal of Microlithography, Microfabrication and Microsystems

Volumn 1, Issue 1, 2002, Pages 13-30

  Rosenbluth, Alan E ^a   Singh, Rama N ^a   Bukofsky, Scott ^b   Fonseca, Carlos ^b   Lai, Kafai ^b   Molless, Antoinette ^b   Hibbs, Michael ^c   Wong, Alfred K K ^d  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM RESEARCH   (United States)

^c IBM MICROELECTRONICS   (United States)

^d UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Global optimization; Off axis illumination; OPC; RET; Source optimization

Indexed keywords

EID: 71549126234     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1448500     Document Type: Conference Paper

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