Global optimization of the illumination distribution to maximize integrated process window

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Rosenbluth, Alan E ^a   Seong, Nakgeuon ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM RESEARCH   (United States)

Author keywords

Global optimization; MEF; Off axis illumination; OPC; Optical proximity correction; RET; Reticle enhancement technology; SMO; Source mask optimization; Source optimization

Indexed keywords

MEF; OFF-AXIS ILLUMINATION; OPC; OPTICAL PROXIMITY CORRECTION; RET; RETICLE ENHANCEMENT TECHNOLOGY; SMO; SOURCE MASK OPTIMIZATION; SOURCE OPTIMIZATION;

APPROXIMATION THEORY; COMPUTATIONAL COMPLEXITY; FUNCTION EVALUATION; GLOBAL OPTIMIZATION; NONLINEAR OPTICS; NUMERICAL ANALYSIS;

LITHOGRAPHY;

EID: 33745776689     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656950     Document Type: Conference Paper

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