Fast pixel-based mask optimization for inverse lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 4, 2006, Pages

  Granik, Yuri ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Illuminator optimization; OPC; Optical lithography; Optical proximity correction; Resolution enhancement techniques; RET

Indexed keywords

ILLUMINATOR OPTIMIZATION; NASHOLD PROJECTIONS; OPTICAL PROXIMITY CORRECTION (OPC); RESOLUTION ENHANCEMENT TECHNIQUES (RET);

INVERSE PROBLEMS; NONLINEAR ANALYSIS; OPTIMIZATION; PHOTOLITHOGRAPHY; PIXELS; QUADRATIC PROGRAMMING;

PHOTOMASKS;

LITHOGRAPHY;

EID: 33947125199     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2399537     Document Type: Article

References (32)

1. T. Sandstrom et al., "OML: Optical maskless lithography for economic design prototyping and small-volume production," Proc. SPIE 5377, 777-797 (2004).
2. S. I. Sayegh, "Image restoration and image design in non-linear optical systems," PhD Thesis, Univ. of Wisconsin, Madison (1982).
3. Y. Granik, "Source optimization for image fidelity and throughput," J. Microlithogr., Microfabr., Microsyst. 3, 509-552 (2004).
4. K. Nashold, "Image synthesis - a means of producing superresolved binary images through bandlimited systems," PhD Thesis, Univ. of Wisconsin, Madison (1987).
5. R. W. Gerchberg and W. O. Saxton, "A practical algorithm for the determination of phase from image and diffraction plane pictures," Optik (Jena) 35, 237-246 (1972).
6. B. E. A. Saleh, "Optical bilinear transformation: General properties," Opt. Acta 26(6), 777-799 (1979).
7. Y. C. Pati and T. Kailath, "Phase-shifting masks for microlithography: Automated design and mask requirements," J. Opt. Soc. Am. A 11(9), 2438-2452 (1994).
8. H. Gamo, "Matrix treatment of partial coherence," Prog. Opt. 3, 189-332 (1963).
9. Y. Liu and A. Zachor, "Optimal binary image design for optical lithography," Proc. SPIE 1264, 401-412 (1990).
10. Y. Liu and A. Zachor, "Binary and phase-shifting image design for optical lithography," Proc. SPIE 1463, 382-399 (1991).
11. Y.-H. Oh, J.-C. Lee, and S. Lim, "Resolution enhancement through optical proximity correction and stepper parameter optimization for 0.12 μm mask pattern," Proc. SPIE 3679, 607-613 (1999).
12. Y.-H. Oh, J.-C. Lee, K.-C. Park, C. S. Go, and S. Lim, "Optical proximity correction of critical layers in DRAW process of 12 μm minimum feature size," Proc. SPIE 4346, 1567-1574 (2001).
13. S.-H. Jang et al., "Manufacturability evaluation of model-based OPC masks," Proc. SPIE 4889, 520-529 (2002).
14. A. Rosenbluth et al., "Optimum mask and source patterns to print a given shape," J. Microlithogr., Microfabr., Microsyst. 1, 13-30 (2002).
15. N. Cobb and A. Zakhor, "Fast, low-complexity mask design," Proc. SPIE 2440, 313-327 (1995).
16. R. Socha et al., "Contact hole reticle optimization by using interference mapping lithography (IML)," Proc. SPIE 5446, 516-534 (2004).
17. P. E. Gill, W. Murray, and M. H. Wright, Practical Optimization, Academic Press, San Diego (2003).
18. A. Erdmann, T. Fuhner, T. Schnattinger, and B. Tollkuhn, "Towards automatic mask and source optimization for optical lithography," Proc. SPIE 5377, 646-657 (2004).
19. A. Poonawala and P. Milanfar, "Prewarping techniques in imaging: Applications in nanotechnology and biotechnology," Proc. SPIE 5674, 114-127 (2005).
20. Y. Granik, "Solving inverse problems of optical microlithography, " Proc. SPIE 5754, 506-526 (2005).
21. B. E. A. Saleh and K. Nashold, "Image construction: Optimum amplitude and phase masks in photolithography," Appl. Opt. 24, 1432-1437 (1985).
22. J. R. Fienup, "Phase retrieval algorithms: a comparison," Appl. Opt. 21, 2758-2769 (1982).
23. H. Takajo et al., "Further study on the convergence property of the hybrid input-output algorithm used for phase retrieval," J. Opt. Soc. Am. A 16(9), 2163-2168 (1999).
24. N. Gould, "Quadratic programming: Theory and methods," 3rd, FNRC Cycle in Math. Programming, Belgium, 2000.
25. C.-G. Han, P. Pardalos, and Y. Ye, "On the solution of indefinite quadratic problems using an interior-point algorithm," Informatica 3(4), 474-496 (1992).
26. D. C. Sorensen, "Newton's method with a model trust region modification," SIAM (Soc. Ind. Appl. Math.) J. Numer. Anal. 19, 409-426 (1982).
27. D. Luenberger, "Linear and nonlinear programming," Kluwer Academic Publishers, Norwell, Mass. (2003).
28. S. Inoue, T. Fujisawa, S. Tamaushi, and Y. Ogawa, "Optimization of partially coherent optical system for optical lithography," J. Vac. Sci. Technol. B 10(6), 3004-3007 (1992).
29. M. Minoux, "Mathematical programming," in Theory and Algorithms, Wiley, New York (1986).
30. N. B. Cobb, "Fast optical and process proximity correction algorithms for integrated circuit manufacturing," PhD Thesis, Univ. of California at Berkeley (1998).
31. S. Shang et al., "Simulation-based SRAF insertion for 65-nm contact hole layers," Proc. SPIE 5992, 633-642 (2005).
32. M. Hsu et al. "Model-based scattering bars implementation for 65-nm and 45-nm nodes using IML technology," Proc. SPIE 5853, 659-671 (2005).