Hotspot fixing using ILT

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7973, Issue , 2011, Pages

  Sim, Woojoo ^a   Jung, Sunggon ^a   Lee, Hyun Jong ^a   Suh, Sungsoo ^a   Ser, Junghoon ^a   Choi, Seong Woon ^a   Kang, Chang Jin ^a   Cecil, Thomas ^b   Ashton, Chris ^b   Irby, David ^b   Zhou, Xin ^b   Son, D H ^b   Xiao, Guangming ^b   Kim, David ^b  

^a SAMSUNG Electronics   (South Korea)

^b Luminescent Technologies Inc   (United States)

Author keywords

Hotspot; ILT; Model matching; OPC

Indexed keywords

BOUNDARY REGIONS; EDGE SEGMENTATION; HOT SPOT; ILT; INVERSE LITHOGRAPHY; LARGE DESIGNS; LOW K1 LITHOGRAPHY; MASK DESIGN; MODEL MATCHING; OPC; RESOLUTION ENHANCEMENT TECHNIQUE; RUNTIMES; SCATTERING BARS; TRANSITION REGIONS;

LITHOGRAPHY;

DESIGN;

EID: 79959225599     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879781     Document Type: Conference Paper

References (5)

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5. ChinTeong Lim, Vlad Temchenko, and Martin Niehoff, "Selective inverse lithography methodology, " Proc. SPIE 7640, 764034 (2010), DOI:10.1117/12.845464.