Radiometric consistency in source specifications for lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Rosenbluth, Alan E ^a   Azpiroz, Jaione Tirapu ^b   Lai, Kafai ^b   Tian, Kehan ^b   Melville, David O S ^a   Totzeek, Michael ^c   Blahnik, Viadan ^c   Koolen, Armand ^d   Flagello, Donis ^e  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM RESEARCH   (United States)

^c CARL ZEISS SMT AG   (Germany)

^d ASML   (Netherlands)

^e ASML US Inc   (United States)

Author keywords

Direction cosine space; Inclination factor; Mask diffraction; Obliquity factor; Radiometry; Source radiance

Indexed keywords

ANGULAR SPECTRUM APPROACH (ASA); DIFFRACTION INTEGRALS; DIFFRACTION ORDERS; DISTORTION (DEFORMATION); GEOMETRICAL INTERPRETATION; GRIDDING; HYPER-NA; INCLINATION FACTOR; INVARIANCE THEOREM; MASK SIMULATION; OPTICAL MICRO LITHOGRAPHY; PLANE WAVE SPECTRUM (PWS); PLANE WAVES; QUANTITATIVE DEFINITION; RAYLEIGH SOMMERFELD DIFFRACTION INTEGRALS; RESIST FILMS; SOLID ANGLES; SOURCE DISTRIBUTIONS; SOURCE ELEMENTS; VECTOR DIFFRACTION THEORY;

COMPUTER NETWORKS; DIFFRACTION; DIFFRACTION PATTERNS; IMAGING SYSTEMS; IMAGING TECHNIQUES; INTEGRAL EQUATIONS; LITHOGRAPHY; LUMINANCE; MAPS; MATHEMATICAL MODELS; OPTICAL DATA STORAGE; OPTICAL PROPERTIES; OPTICS; OPTOELECTRONIC DEVICES; PIXELS; SIMULATORS; SODIUM; SPECIFICATIONS; STANDARDS; WAVES;

CONFORMAL MAPPING;

EID: 45449100342     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.775121     Document Type: Conference Paper

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