Performance of FlexRay: A fully programmable illumination system for generation of freeform sources on high NA immersion systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Mulder, Melchior ^a   Engelen, André ^a   Noordman, Oscar ^a   Streutker, Gert ^a   Van Drieenhuizen, Bert ^a   Van Nuenen, Cas ^a   Endendijk, Wilfred ^a   Verbeeck, Jef ^a   Bouman, Wim ^a   Bouma, Anita ^a   Kazinczi, Robert ^a   Socha, Robert ^a   Jürgens, Dirk ^a   Zimmermann, Joerg ^a   Trauter, Bastian ^a   Bekaert, Joost ^b   Laenens, Bart ^c   Corliss, Daniel ^d   McIntyre, Greg ^e  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

^c CARL ZEISS SMT AG   (Germany)

^d IMEC   (Belgium)

^e IBM MICROELECTRONICS   (United States)

Author keywords

FlexRay; Freeform sources; Programmable Illuminator; Source Mask Optimization

Indexed keywords

ENGINEERING; MOLECULAR PHYSICS;

FLEXRAY; FREEFORM ILLUMINATIONS; FREEFORMS; ILLUMINATION SYSTEM; MACHINE TO MACHINES; PERFORMANCE QUALIFICATIONS; PROGRAMMABLE ILLUMINATOR; SOURCE-MASK OPTIMIZATIONS;

MASKS;

EID: 84861521914     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.845984     Document Type: Conference Paper

References (9)

1. Melchior Mulder et al., "Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems," Proc. SPIE 7520, (2009)
2. Andre Engelen et al., "Imaging solutions for the 22nm node using 1.35NA", Proc. SPIE 7274, (2009)
3. Igor Bouchoms et al., "Extending Single-Exposure Patterning Towards 38-nm Half-Pitch Using 1.35 NA Immersion", Proc. SPIE 7274, (2009)
4. Kafai Lai et al., "Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process", Proc. SPIE 7274, (2009)
5. Alan E. Rosenbluth., "Intensive Optimization of Masks and Sources for 22nm Lithography", Proc. SPIE 7274, (2009)
6. David O. S. Melville et al., "Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulation", Proc. SPIE 7640, (2010)
7. Joerg Zimmermann et al., "Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners", Proc. SPIE 7640, (2010)
8. Joost Bekaert et al., "Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells", Proc. SPIE 7640, (2010)
9. Jin-hyuck Jeon et al., "Analysis of the impact of pupil shape variation by pupil fit modeling", Proc. SPIE 7640, (2010)