SCOPUS 정보 검색 플랫폼

Optics Express

Volumn 17, Issue 7, 2009, Pages 5783-5793

Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography

(2) Xu, Ma a Arce, Gonzalo R a

a UNIVERSITY OF DELAWARE (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEGREES OF FREEDOM (MECHANICS); FOURIER SERIES; MASKS; PHASE SHIFT; PHOTOLITHOGRAPHY; PIXELS; SEMICONDUCTOR DEVICE MANUFACTURE;

COMPUTATIONALLY EFFICIENT; FOURIER-SERIES EXPANSION; OPTICAL PROXIMITY CORRECTIONS; OPTIMIZATION FRAMEWORK; RESOLUTION ENHANCEMENT; RESOLUTION ENHANCEMENT TECHNIQUE; SEMICONDUCTOR INDUSTRY; TOPOLOGICAL CONSTRAINTS;

LITHOGRAPHY;

ALGORITHM; ARTICLE; COMPUTER SIMULATION; ILLUMINATION; MATERIALS; METHODOLOGY; OPTICS; PHOTOGRAPHY; THEORETICAL MODEL;

ALGORITHMS; COMPUTER SIMULATION; LIGHTING; MANUFACTURED MATERIALS; MODELS, THEORETICAL; OPTICS AND PHOTONICS; PHOTOGRAPHY;

EID: 65249121385 PISSN: None EISSN: 10944087 Source Type: Journal
DOI: 10.1364/OE.17.005783 Document Type: Article

Times cited : (98)

References (9)

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2
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3
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- Schellenberg, F.¹

4
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- Schellenberg, F.¹

5
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6
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- Fast and low-complexity mask design in optical microlithography - An inverse imaging problem
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- Poonawala, A.¹ Milanfar, P.²

7
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- Improving resolution in photolithography with a phase-shifting mask
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8
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9
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- Generalized inverse lithography methods for phase-shifting mask design
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.