-
1
-
-
77952030079
-
Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems
-
Mulder, M., et. al., "Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems, " Proc. SPIE 7520 (2009).
-
(2009)
Proc. SPIE
, vol.7520
-
-
Mulder, M.1
-
2
-
-
0035758402
-
Optimum mask and source patterns to print a given shape
-
Rosenbluth, A., "Optimum Mask and Source Patterns to Print a Given Shape, " Proc. SPIE 4346, p. 486 (2001).
-
(2001)
Proc. SPIE
, vol.4346
, pp. 486
-
-
Rosenbluth, A.1
-
3
-
-
0031655070
-
Illuminator design for the printing of regular contact patterns
-
Burkhardt, M., et. al.,:Illuminator design for the printing of regular contact patterns, " Microelectronic Engineering, vol. 41, p. 91 (1998).
-
(1998)
Microelectronic Engineering
, vol.41
, pp. 91
-
-
Burkhardt, M.1
-
4
-
-
0033725368
-
The customize illumination aperture filter for low k1 photolithography process
-
Gau, T.S., et. al., "The Customize Illumination Aperture Filter for Low k1 Photolithography Process, " Proc. SPIE 4000, p. 271 (2000).
-
(2000)
Proc. SPIE
, vol.4000
, pp. 271
-
-
Gau, T.S.1
-
5
-
-
28544439462
-
Layout and source dependent phase mask transmission tuning
-
Progler, C. J., et. al., "Layout and source dependent phase mask transmission tuning, " Proc. SPIE 5454 (2005).
-
(2005)
Proc. SPIE
, vol.5454
-
-
Progler, C.J.1
-
6
-
-
28544444163
-
Simultaneous source mask optimization (SMO)
-
Socha, R., et. al., "Simultaneous source mask optimization (SMO), " Proc. SPIE 5853 (2005).
-
(2005)
Proc. SPIE
, vol.5853
-
-
Socha, R.1
-
7
-
-
62449227890
-
An innovative source-mask co-optimization (SMO) method for extending low k1 imaging
-
Hsu, S., et. al., "An innovative source-mask co-optimization (SMO) method for extending low k1 imaging, " Proc. SPIE 7140 (2008).
-
(2008)
Proc. SPIE
, vol.7140
-
-
Hsu, S.1
-
8
-
-
42149096781
-
The MEEF NILS divergence for low k1 lithography
-
Schenker, R., et. al., "The MEEF NILS divergence for low k1 lithography, " Proc. SPIE 6730 (2007).
-
(2007)
Proc. SPIE
, vol.6730
-
-
Schenker, R.1
-
9
-
-
0001846054
-
Theory of high-NA imaging in homogeneous thin films
-
Flagello, D., et. al., "Theory of high-NA imaging in homogeneous thin films, " J. of Opt. Soc. Am. A, vol. 13, no. 1, pg 53- 64 (1996). (Pubitemid 126542132)
-
(1996)
Journal of the Optical Society of America A: Optics and Image Science, and Vision
, vol.13
, Issue.1
, pp. 53-64
-
-
Flagello, D.G.1
Milster, T.2
Rosenbluth, A.E.3
-
10
-
-
0036416070
-
High-NA lithographic imagery at Brewster's angle
-
Brunner, T., et. al., "High-NA lithographic imagery at Brewster's angle, " Proc. SPIE 4691 (2002).
-
(2002)
Proc. SPIE
, vol.4691
-
-
Brunner, T.1
-
11
-
-
35048869143
-
Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's
-
Rosenbluth, A., et. al., "Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's, " Proc. SPIE 6520 (2007).
-
(2007)
Proc. SPIE
, vol.6520
-
-
Rosenbluth, A.1
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