메뉴 건너뛰기




Volumn 7973, Issue , 2011, Pages

Freeform and SMO

Author keywords

Illumination; Mask; Optimization; Polarization; SMO; Source; Transverse electric; Transverse magnetic; Wafer thin film

Indexed keywords

SMO; SOURCE; TRANSVERSE ELECTRICS; TRANSVERSE MAGNETIC; WAFER THIN-FILM;

EID: 79959213944     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.883317     Document Type: Conference Paper
Times cited : (16)

References (12)
  • 1
    • 77952030079 scopus 로고    scopus 로고
    • Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems
    • Mulder, M., et. al., "Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems, " Proc. SPIE 7520 (2009).
    • (2009) Proc. SPIE , vol.7520
    • Mulder, M.1
  • 2
    • 0035758402 scopus 로고    scopus 로고
    • Optimum mask and source patterns to print a given shape
    • Rosenbluth, A., "Optimum Mask and Source Patterns to Print a Given Shape, " Proc. SPIE 4346, p. 486 (2001).
    • (2001) Proc. SPIE , vol.4346 , pp. 486
    • Rosenbluth, A.1
  • 3
    • 0031655070 scopus 로고    scopus 로고
    • Illuminator design for the printing of regular contact patterns
    • Burkhardt, M., et. al.,:Illuminator design for the printing of regular contact patterns, " Microelectronic Engineering, vol. 41, p. 91 (1998).
    • (1998) Microelectronic Engineering , vol.41 , pp. 91
    • Burkhardt, M.1
  • 4
    • 0033725368 scopus 로고    scopus 로고
    • The customize illumination aperture filter for low k1 photolithography process
    • Gau, T.S., et. al., "The Customize Illumination Aperture Filter for Low k1 Photolithography Process, " Proc. SPIE 4000, p. 271 (2000).
    • (2000) Proc. SPIE , vol.4000 , pp. 271
    • Gau, T.S.1
  • 5
    • 28544439462 scopus 로고    scopus 로고
    • Layout and source dependent phase mask transmission tuning
    • Progler, C. J., et. al., "Layout and source dependent phase mask transmission tuning, " Proc. SPIE 5454 (2005).
    • (2005) Proc. SPIE , vol.5454
    • Progler, C.J.1
  • 6
    • 28544444163 scopus 로고    scopus 로고
    • Simultaneous source mask optimization (SMO)
    • Socha, R., et. al., "Simultaneous source mask optimization (SMO), " Proc. SPIE 5853 (2005).
    • (2005) Proc. SPIE , vol.5853
    • Socha, R.1
  • 7
    • 62449227890 scopus 로고    scopus 로고
    • An innovative source-mask co-optimization (SMO) method for extending low k1 imaging
    • Hsu, S., et. al., "An innovative source-mask co-optimization (SMO) method for extending low k1 imaging, " Proc. SPIE 7140 (2008).
    • (2008) Proc. SPIE , vol.7140
    • Hsu, S.1
  • 8
    • 42149096781 scopus 로고    scopus 로고
    • The MEEF NILS divergence for low k1 lithography
    • Schenker, R., et. al., "The MEEF NILS divergence for low k1 lithography, " Proc. SPIE 6730 (2007).
    • (2007) Proc. SPIE , vol.6730
    • Schenker, R.1
  • 10
    • 0036416070 scopus 로고    scopus 로고
    • High-NA lithographic imagery at Brewster's angle
    • Brunner, T., et. al., "High-NA lithographic imagery at Brewster's angle, " Proc. SPIE 4691 (2002).
    • (2002) Proc. SPIE , vol.4691
    • Brunner, T.1
  • 11
    • 35048869143 scopus 로고    scopus 로고
    • Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's
    • Rosenbluth, A., et. al., "Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's, " Proc. SPIE 6520 (2007).
    • (2007) Proc. SPIE , vol.6520
    • Rosenbluth, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.