Computational lithography and computational metrology for nanomanufacturing

NEMS 2011 - 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems

Volumn , Issue , 2011, Pages 1093-1099

  Liu, Shiyuan ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

computational lithography; computational metrology; model based metrology; nanomanufacturing; nanometrology; optical meteology; optical proximity correction

Indexed keywords

COMPUTATIONAL METROLOGY; NANO-MANUFACTURING; NANOMETROLOGY; OPTICAL METEOLOGY; OPTICAL PROXIMITY CORRECTIONS;

LITHOGRAPHY; UNITS OF MEASUREMENT;

MEASUREMENTS;

EID: 80053305192     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NEMS.2011.6017547     Document Type: Conference Paper

References (33)

1. G. Chryssolouris, P. Stavropoulos, G. Tsoukantas, K. Salonitis, and A. Stournaras, "Nanomanufacturing process: a critical review," Int. J. Mater. Prod. Technol., vol. 21, pp. 331-348, 2004.
2. H. Sengul, T. L. Theis, and S. Ghosh, "Toward sustainable nanoproducts: an overview of nanomanufacturing methods," J. Ind. Ecol., vol. 12, pp. 329-359, 2008.
3. E. Y. Lam and A. K. Wong, "Computation lithography: virtual reality and virtual virtuality," Opt. Express, vol. 17, pp. 12259-12268, 2009.
4. K. W. Lyons and M. T. Postek, "Metrology at the nanoscale: what are the grand challenges?" in Proc. SPIE, 2008, vol. 7042, 704202.
5. M. T. Postek and K. Lyons, "Instrumentation, metrology, and standards: key elements for the future of nanomanufacturing," in Proc. SPIE, 2007, vol. 6648, 664802.
6. P. Weidner, A. Kasic, T. Hingst, C. Ehlers, S. Philipp, T. Marschner, and M. Moert, "Model-free and model-based methods for dimensional metrology during the lifetime of a product," in Proc. SPIE, 2008, vol. 7155, pp. 1550-1550.
7. H. T. Huang and F. L. Terry, "Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring," Thin Solid Films, vol. 468, pp. 338-346, 2004.
8. M. Losurdo, M. Bergmair, G. Bruno, D. Cattelan, C. Cobet, A. D. Martino, et al., "Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives," J. Nanopart. Res., vol. 11, pp. 1521-1554, 2009.
9. H. Hopkins, "On the diffraction theory of optical images," Proc. R. Soc. A, vol. 217, pp. 408-432, 1953.
10. E. Kintner, "Method for the calculation of partially coherent imagery," Appl. Opt., vol. 17, pp. 2747-2753, 1978. (Pubitemid 9415551)
11. S. Subramanian, "Rapid Calculation of defocused partially coherent images," Appl. Opt., vol. 20, pp. 1854-1857, 1981. (Pubitemid 11506414)
12. K. Yamazoe, "Computation theory of partially coherent imaging by stacked pupil shift matrix," J. Opt. Soc. Am. A, vol. 25, pp. 3111-3119, 2008.
13. R. Köhle, "Fast TCC algorithm for the model building of high NA lithography simulation," in Proc. SPIE, 2004, vol. 5754, pp. 918-929. (Pubitemid 41351999)
14. Y. C. Pati and T. Kailath, "Phase-shifting masks for microlithography: automated design and mask requirements," J. Opt. Soc. Am. A, vol. 11, pp. 2438-2452, 1994.
15. N. B. Cobb. "Fast optical and process proximity correction algorithms for integrated circuit manufacturing," Ph.D. dissertation, Univ. of Carifornia Berkeley, 1998.
16. A. Poonawala and P. Milanfar, "Mask design for optical microlithography - an inverse imaging problem," IEEE Trans. Image Process., vol. 16, pp. 774-788, 2007. (Pubitemid 46431973)
17. X. Ma and G. R. Arce, "Generalized inverse lithography methods for phase-shifting mask design," Opt. Express, vol. 15, pp. 15066-15079, 2007. (Pubitemid 350130149)
18. X. Ma and G. R. Arce, "PSM design for inverse lithography with partially coherent illumination," Opt. Express, vol. 16, pp. 20126-20141, 2008.
19. F. Zernike, "Beugungstheorie des Schneidenverfahrens und seiner verbesserten form, der Phasenkontrastmethode," Physica, vol. 1, pp. 689-704, 1934.
20. M. Born and E. Wolf, Principles of Optics, 7th ed. Pergamon, 1999, chap. 9.
21. W. Liu, S. Y. Liu, T. T. Zhou, and L. J. Wang, "Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination," Opt. Express, vol. 17, 19278-19291, 2009.
22. W. Liu, S. Y. Liu, T. L. Shi, and Z. R. Tang, "Generalized formulations for aerial image based lens aberration metrology in lithographic tools with arbitrarily shaped illumination sources," Opt. Express, vol. 18, pp. 20096-20104, 2010.
23. R. M. A. Azzam, "Ellipsometry," in Handbook of Optics, 3rd ed, vol. 1. M. Bass and V. N. Mahajan, Eds, McGraw Hill, 2010, pp. 16.1-16.25.
24. M. G. Moharam and T. K. Gaylord, "Rigorous coupled-wave analysis of planar-grating diffraction," J. Opt. Soc. Am., vol. 71, pp. 811-818, 1981. (Pubitemid 12444661)
25. M. G. Moharam, E. B. Grann, and D. A. Pommet, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A, vol. 12, pp. 1068-1076, 1995.
26. T. C. Choi, Effective Medium Theory: Principles and Applications. Oxford University Press, 1999.
27. S. M. Rytov, "Electromagnetic properties of a finely stratified medium," Sov. Phys. JETP, vol. 2, pp. 466-475, 1956.
28. X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, "Specular spectroscopic scatterometry," IEEE Trans. Semicond. Manuf., vol. 14, pp. 97-111, 2001. (Pubitemid 32486965)
29. R. T. Zheng, N. Q. Ngo, L. N. Binh, and S. C. Tjin, "Two-stage hybrid optimization of fiber Bragg gratings for design of linear phase filters," J. Opt. Soc. Am. A, vol. 21, pp. 2399-2405, 2004. (Pubitemid 40009336)
30. K. Hehl, J. Bischoff, U. Mohaupt, et. al., "High-efficiency dielectric reflection gratings: design, fabrication, and analysis," Appl. Opt., vol. 38, pp. 6257-6271, 1999. (Pubitemid 129568160)
31. C. W. Zhang, S. Y. Liu, T. L. Shi, and Z. R. Tang, "Fitting- determined formulation of effective medium approximation for 3D trench structures in model-based infrared reflectrometry," J. Opt. Soc. Am. A, vol. 28, pp. 263-271, 2011
32. C. W. Zhang, S. Y. Liu, T. L. Shi, and Z. R. Tang, "Improved model-based infrared reflectrometry for measuring deep trench structures," J. Opt. Soc. Am. A, vol. 26, pp. 2327-2335, 2009.
33. T. Novikova, A. D. Martino, P. Bulkin, Q. Nguyen, and B. Drévillon, "Metrology of replicated diffractive optics with Mueller polarimetry in conical diffraction," Opt. Express, vol. 15, pp. 2033-2046, 2007. (Pubitemid 46376869)