Towards automatic mask and source optimization for optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 646-657

  Erdmann, Andreas ^a   Fühner, Tim ^a   Schnattinger, Thomas ^a   Tollkühn, Bernd ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

Genetic algorithms; Image modeling; Optical lithography; Resolution enhancement

Indexed keywords

ABERRATIONS; COMPUTER SOFTWARE; GENETIC ALGORITHMS; INTEGRATED OPTICS; MATHEMATICAL MODELS; OPTIMIZATION; POLARIZATION; SURFACE TOPOGRAPHY;

IMAGE MODELING; MASK TOPOGRAPHY EFFECTS; RESOLUTION ENHANCEMENT;

PHOTOLITHOGRAPHY;

EID: 3843087204     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533215     Document Type: Conference Paper

References (13)

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