Simultaneous Source Mask Optimization (SMO)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART I, Issue , 2005, Pages 180-193

  Socha, Robert ^a   Shi, Xuelong ^a   LeHoty, David ^a  

^a ASML US Inc   (United States)

Author keywords

Chromeless phase lithography; CPL; Illumination; IML; Mask; Optimization; SMO; Source

Indexed keywords

EIGENVALUES AND EIGENFUNCTIONS; FREQUENCY DOMAIN ANALYSIS; ILLUMINATING ENGINEERING; INTEGRAL EQUATIONS; OPTIMIZATION; PHOTOLITHOGRAPHY;

CHROMELESS PHASE LITHOGRAPHY (CPL); IML; SMO; SOURCE;

MASKS;

EID: 28544444163     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617431     Document Type: Conference Paper

References (11)

1. Rosenbluth, A., Optimum Mask and Source Patterns to Print a Given Shape, in Proc. SPIE, vol. 4346, 2001, p. 486.
2. Burkhardt, M., et. al., Illuminator design for the printing of regular contact patterns, Microelectronic Engineering, vol. 41, 1998, p. 91.
3. Gau, T.S., et. al., The Customize Illumination Aperture Filter for Low k1 Photolithography Process, in Proc. SPIE, vol. 4000, 2000, p. 271.
4. Progler, C. J., et. al., Layout and source dependent phase mask transmission tuning, in Proc. SPIE, vol. 5454, 2005.
5. Abbe, E., Beiträge zur Theorie des Midroskops und der mikroskopischen Wahrnehmung, Archiv für Mikroskopische Anatomie, 1873.
6. D.J. Van Den Brocke, D.J. et. al., Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL), in Proc. SPIE Vol. 5256, 2003, p. 297-308.
7. Socha, R.J., et. al., Contact Hole Reticle Optimization by Using Interference Mapping Lithography, in Proc. SPIE, vol. 5377, 2004, p. 222.
8. Hsu, C.M., et. al., Lithography manufacturing implementation for 65-nm and 45-nm nodes with model-based scattering bars using IML technology, in Proc. SPIE, vol. 5454, 2005.
9. Wang, J., et. al., Standard Cell Layout With Regular Contact Placement, in IEEE Trans. of Semiconductor Manufacturing, vol. 17, no. 3, 2004, pp. 375-383.
10. Cobb, N., Fast optical and proximity correction algorithms for integrated circuit manufacturing, Ph. D. Dissertation, University of California at Berkeley, 1998.
11. Hopkins, H.H., The concept of partial coherence in optics, Proc. Roy. Soc. A, vol. 217, 1953, p. 408.