Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Rosenbluth, Alan E ^a   Melville, David ^a   Tian, Kehan ^b   Lai, Kafai ^b   Seong, Nakgeuon ^b,c   Pfeiffer, Dirk ^a   Colburn, Matthew ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM RESEARCH   (United States)

^c PHOTRONICS INC   (United States)

Author keywords

DFM; High numerical aperture; Inverse lithography; OPC; RET; Reticle enhancement technology; SMO; TM contrast

Indexed keywords

HIGH NUMERICAL APERTURE; INVERSE LITHOGRAPHY; OPTICAL PROXIMITY CORRECTION; RETICLE ENHANCEMENT TECHNOLOGY (RET);

CONSTRAINT THEORY; CONTRAST MEDIA; DIFFRACTION; EIGENVALUES AND EIGENFUNCTIONS; GLOBAL OPTIMIZATION; IMAGING SYSTEMS;

MASKS;

EID: 35048869143     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713050     Document Type: Conference Paper

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