Computation lithography: Virtual reality and virtual virtuality

Optics Express

Volumn 17, Issue 15, 2009, Pages 12259-12268

  Lam, Edmund Y ^a   Wong, Alfred K K ^a  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

MACHINE DESIGN; VIRTUAL REALITY;

INVERSE LITHOGRAPHY; IS-ENABLED; MATHEMATICAL ABSTRACTION; VIRTUAL WORLDS;

LITHOGRAPHY;

ALGORITHM; ARTICLE; COMPUTER SIMULATION; EQUIPMENT DESIGN; METHODOLOGY; OPTICS; PHYSICS; STATISTICAL MODEL; THEORETICAL MODEL;

ALGORITHMS; COMPUTER SIMULATION; EQUIPMENT DESIGN; MODELS, STATISTICAL; MODELS, THEORETICAL; OPTICS AND PHOTONICS; PHYSICS;

EID: 67749116249     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.012259     Document Type: Article

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