Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 415-426

  Fühner, Tim ^a,b   Erdmann, Andreas ^b  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

Automatic Optimization; Genetic Algorithms; Resolution Enhancement Techniques

Indexed keywords

COMPUTER SIMULATION; GENETIC ALGORITHMS; LIGHTING; OPTICAL SYSTEMS; OPTIMIZATION; PHOTOLITHOGRAPHY;

AUTOMATIC OPTIMIZATION; OFF-AXIS ILLUMINATION; OPTICAL PROXIMITY CORRECTION; RESOLUTION ENHANCEMENT TECHNIQUES;

MASKS;

EID: 25144510087     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599410     Document Type: Conference Paper

References (11)

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