Scanner-specific separable models for computational lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Hunsche, Stefan ^a   Xie, Xu ^a   Zhao, Qian ^a   Liu, Hua Yu ^a   Nikolsky, Peter ^b   Ngai, Anthony ^b  

^a ASML US Inc   (United States)

^b ASML   (Netherlands)

Author keywords

Computational lithography; GRAIL; OPC; Predictive model; Separable model; Verification

Indexed keywords

COMPUTATIONAL LITHOGRAPHY; GRAIL; OPC; PREDICTIVE MODEL; SEPARABLE MODEL;

APPROXIMATION THEORY; EXPOSURE METERS; LITHOGRAPHY; PREDICTIVE CONTROL SYSTEMS; TURNAROUND TIME;

SCANNING;

EID: 62649157214     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801706     Document Type: Conference Paper

References (6)

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2. J. Fung Chen, Hua-Yu Liu, Thomas Laidig, Christian Zuniga, Yu Cao, and Robert Socha, "Development of a Computational Lithography Roadmap", Proc. SPIE 6924 (2008)
3. Luoqi Chen, Yu Cao, Hua-yu Liu, Wenjin Shao, Mu Feng, and Jun Ye, "Predictive focus exposure modeling (FEM) for full-chip lithography", Proc. SPIE 6154 (2006).
4. Youping Zhang, Mu Feng, and Hua-yu Liu, "A focus exposure matrix model for full chip lithography manufacturability check and optical proximity correction", Proc. SPIE 6283 (2006).
5. Hua-Yu Liu, Qian Zhao, J. Fung Chen, et al., "Separable OPC Models for Computational Lithography", Proc. SPIE 7028 (2008).
6. Peter Nikolsky, Tjitte Nooitgedagt, Paul van Adrichem, Jeroen Meessen, Carsten Kohler, Baukje Wisse, Stefan Hunsche, Proc. SPIE 7122 (2008).