Source optimization for three-dimensional image designs through film stacks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Melville, David O S ^a   Rosenbluth, Alan E ^a   Tian, Kehan ^b   Goldfarb, Dario ^a   Harrer, Stefan ^b   Colburn, Matthew ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM RESEARCH   (United States)

Author keywords

Dual layer resist; Global optimization; Linear program; Off axis illumination; OPC; Optical proximity correction; RET; Reticle enhancement technology; SMO; Source optimization; Three dimensional

Indexed keywords

DUAL LAYER RESIST; LINEAR PROGRAM; OFF-AXIS ILLUMINATION; OPC; OPTICAL PROXIMITY CORRECTION; RET; RETICLE ENHANCEMENT TECHNOLOGY; SMO; SOURCE OPTIMIZATION;

GLOBAL OPTIMIZATION; IMAGING SYSTEMS; MASKS; OPTICAL CABLES; OPTICAL RESOLVING POWER; THREE DIMENSIONAL; WINDOWS;

OPTIMIZATION;

EID: 65849520885     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814700     Document Type: Conference Paper

References (18)

1. Burkhardt, M., Yen, A., Progler, C., and Wells, G., "Illuminator design for the printing of regular contact patterns," Microelectron. Eng. 41-42, 91-95 (1998).
2. Gau, T. S., Liu, R. G., Chen, C. K., Lai, C. M., Liang, F. J., and Hsia, C. C., "Customized illumination aperture filter for low k1 photolithography process," in [Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series], Progler, C. J., ed., Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series 4000, 271-282 (July 2000).
3. Rosenbluth, A. E., Bukofsky, S., Fonseca, C., Hibbs, M., Lai, K., Molless, A. F., Singh, R. N., and Wong, A. K. K., "Optimum mask and source patterns to print a given shape," Journal of Microlithography, Microfabrication, and Microsystems 1(1), 13-30 (2002).
4. Granik, Y., "Source optimization for image fidelity and throughput," Journal of Microlithography, Microfabrication, and Microsystems 3(4), 509-522 (2004).
5. Socha, R., Shi, X., and Lehoty, D., "Simultaneous source mask optimization (smo)," in [Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series], Komuro, M., ed., Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series 5853, 180-193 (June 2005).
6. Rosenbluth, A. E. and Seong, N., "Global optimization of the illumination distribution to maximize integrated process window," Optical Microlithography XIX 6154(1), SPIE (2006).
7. Cao, H., Yu, Z., Wang, J., Tegenfeldt, J. O., Austin, R. H., Chen, E., Wu, W., and Chou, S. Y., "Fabrication of 10 nm enclosed nanofluidic channels," Applied Physics Letters 81(1), 174-176 (2002).
8. Guo, L., Cheng, X., and Chou, C., "Fabrication of size-controllable nanofluidic channels by nanoimprinting and its application for DNA stretching," Nano letters 4(1), 69-74 (2004).
9. [9] Chou, S. Y., Krauss, P. R., and Renstrom, P. J., "Imprint lithography with 25-nanometer resolution," Science 272, 85-87 (April 1996). (Pubitemid 126554924)
10. Harrer, S., Strobel, S., Scarpa, G., Abstreiter, G., Tomow, M., and Lugli, P., "Room Temperature Nanoimprint Lithography Using Molds Fabricated by Molecular Beam Epitaxy," IEEE Transactions on Nanotechnology 7(3), 363-370 (2008).
11. Li, M., Chen, L., Zhang, W., and Chou, S., "3-Dimensional microfabrication using deep nanoimprint lithography," EIPBNPalms Springs.CA (2000).
12. Zhang, W and Chou, S., "Multilevel nanoimprint lithography with submicron alignment on 4- inch wafers," EIPBN Palms Springs.CA (2000).
13. [13] Wang, J., Schablitsky, S., Yu, Z., Wu, W., and Chou, S. Y., "Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography," Papers from the 43rd international conference on electron, ion, and photon beam technology and nanofabrication 17(6), 2957-2960, AVS (1999). (Pubitemid 129494264)
14. WANG, J. and KOSTAL, H., "Nanoimprint lithography enables fabrication of subwavelength optics," Laser focus world 41(12), 76-81 (2005).
15. Glinsner, T., Hangweier, P., Luesebrink, H., Dorsey, P., and Homola, A., "Nanoimprint lithography enables patterned tracks for high-capacity hard disks," Solid State Technology 48(3), 51-54 (2005).
16. [16] Rosenbluth, A. E., Melville, D. O. S., Tian, K., Lai, K., Seong, N., Pfeiffer, D., and Colburn, M., "Global optimization of masks, including film stack design to restore tm contrast in high na tcc's," Optical Microlithography XX 6520(1), SPIE (2007). (Pubitemid 47554358)
17. Feijoo, G., Tirapu-Azpiroz, J., Rosenbluth, A. E., Oberai, A., Tian, K., Melville, D. O. S., Mohan, J., Gil, D., and Lai, K., "Two stage holographic lithography," in Optical Microlithography XXII, SPIE (2009).
18. Rosenbluth, A. E., Melville, D. O. S., Tian, K., Bagheri, S., Tirapu Azpiroz, J., Lai, K., Waechter, A., Inoue, T., Ladanyi, L., Barahona, F., Scheinberg, K., Sakamoto, M., Muta, H., Gallagher, E., Faure, T., Hibbs, M., Tritchkov, A., and Granik, Y., "Intensive optimization of masks and sources for 22nm lithography," in Optical Microlithography XXII, SPIE (2009).