Source Mask Optimization (SMO) at full chip scale using Inverse Lithography Technology (ILT) based on level set methods

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7520, Issue , 2009, Pages

  Pang, Linyong ^a   Hu, Peter ^a   Peng, Danping ^a   Chen, Dongxue ^a   Cecil, Tom ^a   He, Lin ^a   Xiao, Guangming ^a   Tolani, Vikram ^a   Dam, Thuc ^a   Baik, Ki Ho ^a   Gleason, Bob ^a  

^a Luminescent Technologies Inc   (United States)

Author keywords

ILT; Inverse lithography technology; Level set method; Mask optimization; Resolution enhancement technology; SMO; Source mask optimization; Source optimization

Indexed keywords

INVERSE LITHOGRAPHY; LEVEL SET METHOD; MASK OPTIMIZATION; RESOLUTION ENHANCEMENT TECHNOLOGY; SOURCE OPTIMIZATION;

DROP BREAKUP; EVOLUTIONARY ALGORITHMS; LEVEL MEASUREMENT; LOGIC DEVICES; OPTIMIZATION; TECHNOLOGY;

MASKS;

EID: 77952018465     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.843578     Document Type: Conference Paper

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