30 Years of lithography simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 1-12

  Mack, Chris A ^a  

^a KLA Tencor Austin   (United States)

Author keywords

History of Lithography Simulation; Lithography Simulation; PROLITH

Indexed keywords

COMPUTER SIMULATION; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; SEMICONDUCTING MANGANESE COMPOUNDS;

LITHOGRAPHY SIMULATION; SEMICONDUCTOR INDUSTRY; TECHNOLOGICAL DEVELOPMENT;

LITHOGRAPHY;

EID: 25144497922     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601590     Document Type: Conference Paper

References (53)

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2. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of Positive Photoresist," IEEE Trans. Electron Devices, ED-22, No. 7 (July, 1975) pp. 445-452.
3. K. L. Konnerth and F. H. Dill, "In-Situ Measurement of Dielectric Thickness During Etching or Developing Processes," IEEE Trans. Electron Devices, ED-22, No. 7 (1975) pp. 452-456.
4. F. H. Dill, A. R. Neureuther, J. A. Tuttle, and E. J. Walker "Modeling Projection Printing of Positive Photoresists," IEEE Trans. Electron Devices, ED-22, No. 7 (1975) pp. 456-464.
5. Introduction to Microlithography, L. F. Thompson, C. G. Willson and M. J. Bowden, Eds., ACS Symposium Series, No. 219 (1983).
6. For a more complete history of this effort, see Rick Dill's paper "The Basis for Lithographic Modeling" in these proceedings.
7. W. G. Oldham, S. N. Nandgaonkar, A. R. Neureuther and M. OToole, "A General Simulator for VLSI Lithography and Etching Processes: Part I - Application to Projection Lithography," IEEE Trans. Electron Devices, ED-26, No. 4 (April, 1979) pp. 717-722.
8. C. A. Mack, "PROLITH: A Comprehensive Optical Lithography Model," Optical Microlithography IV, Proc., SPIE Vol. 538 (1985) pp. 207-220.
9. A. R. Neureuther and F. H. Dill, "Photoresist Modeling and Device Fabrication Applications," Optical And Acoustical Micro-Electronics, Polytechnic Press (New York: 1974) pp. 233-249.
10. H. L. Stover, M. Nagler, I. Bol, and V. Miller, "Submicron Optical Lithography: I-line Lens and Photoresist Technology," Optical Microlith. III, Proc., SPIE Vol. 470 (1984) pp. 22-33.
11. I. I. Bol, "High-Resolution Optical Lithography using Dyed Single-Layer Resist," Kodak Microelec. Seminar Interface '84 (1984) pp. 19-22.
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14. M. D. Prouty and A. R. Neureuther, "Optical Imaging with Phase Shift Masks," Optical Microlith. III, Proc., SPIE Vol. 470 (1984) pp. 228-232.
15. C. A. Mack, "Optimum Stepper Performance Through Image Manipulation," KTI Micro-electronics Seminar, Proc., (1989) pp. 209-215.
16. C. A. Mack, "Algorithm for Optimizing Stepper Performance Through Image Manipulation," Optical/Laser Microlithography III, Proc., SPIE Vol. 1264 (1990) pp. 71-82.
17. H. Fukuda, T. Terasawa, and S. Okazaki, "Spatial Filtering for Depth-of-focus and Resolution Enhancement in Optical Lithography," Journal of Vacuum Science and Technology, Vol. B9, No. 6 (Nov/Dec 1991) pp. 3113-3116.
18. C. A. Mack and J. E. Connors, "Fundamental Differences Between Positive and Negative Tone Imaging," Optical/Laser Microlithography V, Proc., SPIE Vol. 1674 (1992) pp. 328-338,
19. and Microlithography World, Vol. 1, No. 3 (Jul/Aug 1992) pp. 17-22.
20. C. A. Mack, "Lithographic Optimization Using Photoresist Contrast," KTI Microlithography Seminar, Proc., (1990) pp. 1-12,
21. and Microelectronics Manufacturing Technology, Vol. 14, No. 1 (Jan. 1991) pp. 36-42.
22. C. A. Mack, "Photoresist Process Optimization," KTI Microelectronics Seminar, Proc., (1987) pp. 153-167.
23. P. Trefonas and C. A. Mack, "Exposure Dose Optimization for a Positive Resist Containing Poly-functional Photoactive Compound," Advances in Resist Technology and Processing VIII, Proc., SPIE Vol. 1466 (1991).
24. J. S. Petersen, C. A. Mack, J. Sturtevant, J. D. Byers and D. A. Miller, "Non-constant Diffusion Coefficients: Short Description of Modeling and Comparison to Experimental Results," Advances in Resist Technology and Processing XII, Proc., SPIE Vol. 2438 (1995).
25. C. A. Mack and P. M. Kaufman, "Mask Bias in Submicron Optical Lithography," Jour. Vac. Sci. Tech., Vol. B6, No. 6 (Nov./Dec. 1988) pp. 2213-2220.
26. N. Shamma, F. Sporon-Fielder and E. Lin, "A Method for Correction of Proximity Effect in Optical Projection Lithography," KTI Microelectronics Seminar, Proc., (1991) pp. 145-156.
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28. J. Wiley, "Effect of Stepper Resolution on the Printability of Submicron 5x Reticle Defects," Optical/Laser Microlithography II, Proc., SPIE Vol. 1088 (1989) pp. 58-73.
29. L.M. Milner, K.C. Hickman, S.M. Gasper, K.P. Bishop, S.S.H. Naqvi, J.R. McNeil, M. Blain, and B.L. Draper, "Latent Image Exposure Monitor Using Scatterometry," SPIE Vol. 1673 (1992) pp. 274-283.
30. K.P. Bishop, L.M. Milner, S.S.H. Naqvi, J.R. McNeil, and B.L. Draper, "Use of Scatterometry for Resist Process Control," SPIE Vol. 1673 (1992) pp. 441-452
31. L.M. Milner, K.P. Bishop, S.S.H. Naqvi, and J.R. McNeil, "Lithography Process Monitor Using Light Diffracted from a Latent Image," SPIE Vol. 1926 (1993) pp. 94-105.
32. S. Zaidi, S.L. Prins, J.R. McNeil, and S.S.H. Naqvi, "Metrology Sensors for Advanced Resists," SPIE Vol. 2196 (1994) pp. 341-351
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34. W. Conley, R. Akkapeddi, J. Fahey, G. Hefferon, S. Holmes, G. Spinillo, J. Turtevant, and K. Welsh, "Improved Reflectivity Control of APEX-E Positive Tone Deep-UV Photoresist," SPIE Vol. 2195 (1994) pp. 461-476.
35. N. Thane, C. Mack, and S. Sethi, "Lithographic Effects of Metal Reflectivity Variations," SPIE Vol. 1926 (1993) pp. 483-494.
36. B. Singh, S. Ramaswami, W. Lin, and N. Avadhany, "IC Wafer Reflectivity Measurement in the UV and DUV and Its Application for ARC Characterization," SPIE Vol. 1926 (1993) pp. 151-163.
37. S.S. Miura, C.F. Lyons, and T.A. Brunner, "Reduction of Linewidth Variation over Reflective Topography," SPIE Vol. 1674 (1992) pp. 147-156.
38. H. Yoshino, T. Ohfuji, and N. Aizaki, "Process Window Analysis of the ARC and TAR Systems for Quarter Micron Optical Lithography," SPIE Vol. 2195 (1994) pp. 236-245.
39. G. Flores, W. Rack, and L. Dwyer, "Lithographic Performance of a New Generation I-line Optical System: A Comparative Analysis," SPIE Vol. 1927 (1993) pp. 899-913.
40. B. Kuyel, M. Barrick, A. Hong, and J. Vigil, "0.5 Micron Deep UV Lithography Using a Micrascan-90 Step-And-Scan Exposure Tool," SPIE Vol. 1463 (1991) pp. 646-665.
41. G.E. Flores, W.W. Rack, and E. Tai, "An Investigation of the Properties of Thick Photoresist Films," SPIE Vol. 2195 (1994) pp. 734-751.
42. H. Iwasaki, T. Itani, M. Fujimoto, and K. Kasama, "Acid Size Effect of Chemically Amplified Negative Resist on Lithographic Performance," SPIE Vol. 2195 (1994) pp. 164-172.
43. U. Schaedeli, N. Münzel, H. Holzwarth, S.G. Slater, and O. Nalamasu, "Relationship Between Physical Properties and Lithographic Behavior in a High Resolution Positive Tone Deep-UV Resist," SPIE Vol. 2195 (1994) pp. 98-110.
44. K. Schlicht, P. Scialdone, P. Spragg, S.G. Hansen, R.J. Hurditch, M.A. Toukhy, and D.J. Brzozowy, "Reliability of Photospeed and Related Measures of Resist Performances," SPIE Vol. 2195 (1994) pp. 624-639.
45. R.A. Cirelli, E.L. Raab, R.L. Kostelak, and S. Vaidya, "Optimizing Numerical Aperture and Partial Coherence to Reduce Proximity Effect in Deep-UV Lithography," SPIE Vol. 2197 (1994) pp. 429-439.
46. B. Katz, T. Rogoff, J. Foster, B. Rericha, B. Rolfson, R. Holscher, C. Sager, and P. Reynolds, "Lithographic Performance at Sub-300 nm Design Rules Using High NA I-line Stepper with Optimized NA and a in Conjunction with Advanced PSM Technology," SPIE Vol. 2197 (1994) pp. 421-428.
47. P. Luehrmann, and S. Wittekoek, "Practical 0.35 μm I-line Lithography," SPIE Vol. 2197 (1994) pp. 412-420.
48. V.A. Deshpande, K.L. Holland, and A. Hong, "Isolated-grouped Linewidth Bias on SVGL Micrascan," SPIE Vol. 1927 (1993) pp. 333-352.
49. R.C. Henderson, and O.W. Otto, "Correcting for Proximity Effect Widens Process Latitude," SPIE Vol. 2197 (1994) pp. 361-370.
50. H. Engstrom and J. Beacham, "Online Photolithography Modeling Using Spectrophotometry and PROLITH/2," SPIE Vol. 2196 (1994) pp. 479-485.
51. J. Kasahara, M. V. Dusa, and T. Perera, "Evaluation of a Photoresist Process for 0.75 Micron, G-line Lithography," SPIE Vol. 1463 (1991) pp. 492-503.
52. E. A. Puttlitz, J. P. Collins, T. M. Glynn, L. L. Linehan, "Characterization of Profile Dependency on Nitride Substrate Thickness for a Chemically Amplified I-line Negative Resist," SPIE Vol. 2438 (1995) pp. 571-582.
53. P. M. Mahoney and C. A. Mack, "Cost Analysis of Lithographic Characterization: An Overview," Optical/Laser Microlithography VI, Proc., SPIE Vol. 1927 (1993) pp. 827-832.