Aerial imaging qualification and metrology for source mask optimization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7638, Issue , 2010, Pages

  Sagiv, Amir ^a   Finders, Jo ^b   Kazinczi, Robert ^b   Engelen, Andre ^b   Duray, Frank ^b   Minnaert Janssen, Ingrid ^b   Mangan, Shmoolik ^a   Kasimov, Dror ^a   Englard, Ilan ^a  

^a Applied Materials Inc Israel   (Israel)

^b ASML   (Netherlands)

Author keywords

Inspection; Logic; Mask; Memory; Reticle; Source Mask Optimization

Indexed keywords

ADVANCED TESTS; AERIAL IMAGING; APPLIED MATERIALS; ILLUMINATION SOURCES; IMPROVED PROCESS; LOGIC; MASK INSPECTION TOOL; MASK OPTIMIZATION; MEMORY; PATTERN PROCESS; RETICLE; SEMICONDUCTOR INDUSTRY; SOURCE-MASK OPTIMIZATION; TECHNOLOGY NODES;

DYNAMIC RANDOM ACCESS STORAGE; INSPECTION; MASKS; MEASUREMENTS; OPTIMIZATION; SEMICONDUCTOR DEVICE MANUFACTURE; UNITS OF MEASUREMENT;

PROCESS CONTROL;

EID: 77954410154     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848376     Document Type: Conference Paper

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